Going far beyond the near-field diffraction limit via plasmonic cavity lens with high spatial frequency spectrum off-axis illumination
文献类型：期刊论文
| 作者 | Zhao, Zeyu; Luo, Yunfei; Zhang, Wei; Wang, Changtao; Gao, Ping; Wang, Yanqin; Pu, Mingbo; Yao, Na; Zhao, Chengwei; Luo, Xiangang |
| 刊名 | SCIENTIFIC REPORTS
 |
| 出版日期 | 2015-10-19 |
| 卷号 | 5 |
| ISSN号 | 2045-2322 |
| 英文摘要 | For near-field imaging optics, minimum resolvable feature size is highly constrained by the near-field diffraction limit associated with the illumination light wavelength and the air distance between the imaging devices and objects. In this study, a plasmonic cavity lens composed of Ag-photoresist-Ag form incorporating high spatial frequency spectrum off-axis illumination (OAI) is proposed to realize deep subwavelength imaging far beyond the near-field diffraction limit. This approach benefits from the resonance effect of the plasmonic cavity lens and the wavevector shifting behavior via OAI, which remarkably enhances the object's subwavelength information and damps negative imaging contribution from the longitudinal electric field component in imaging region. Experimental images of well resolved 60-nm half-pitch patterns under 365-nm ultra-violet light are demonstrated at air distance of 80 nm between the mask patterns and plasmonic cavity lens, approximately four-fold longer than that in the conventional near-field lithography and superlens scheme. The ultimate air distance for the 60-nm half-pitch object could be theoretically extended to 120 nm. Moreover, two-dimensional L-shape patterns and deep subwavelength patterns are illustrated via simulations and experiments. This study promises the significant potential to make plasmonic lithography as a practical, cost-effective, simple and parallel nano-fabrication approach. |
| WOS标题词 | Science & Technology |
| 类目[WOS] | Multidisciplinary Sciences |
| 研究领域[WOS] | Science & Technology - Other Topics |
| 关键词[WOS] | SCANNING INTERFEROMETER ; THICKNESS MEASUREMENT ; SILVER SUPERLENS ; LITHOGRAPHY ; RESOLUTION ; PHOTOLITHOGRAPHY ; EVANESCENT ; LIGHT ; FILM ; NANOLITHOGRAPHY |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000362988400001 |
| 公开日期 | 2015-12-24 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/3719]  |
| 专题 | 光电技术研究所_光电技术研究所被WoS收录文章 |
| 作者单位 | Chinese Acad Sci, State Key Lab Opt Technol Nanofabricat & Microeng, Inst Opt & Elect, Chengdu 610209, Peoples R China |
| 推荐引用方式 GB/T 7714 | Zhao, Zeyu,Luo, Yunfei,Zhang, Wei,et al. Going far beyond the near-field diffraction limit via plasmonic cavity lens with high spatial frequency spectrum off-axis illumination[J]. SCIENTIFIC REPORTS,2015,5. |
| APA | Zhao, Zeyu.,Luo, Yunfei.,Zhang, Wei.,Wang, Changtao.,Gao, Ping.,...&Luo, Xiangang.(2015).Going far beyond the near-field diffraction limit via plasmonic cavity lens with high spatial frequency spectrum off-axis illumination.SCIENTIFIC REPORTS,5. |
| MLA | Zhao, Zeyu,et al."Going far beyond the near-field diffraction limit via plasmonic cavity lens with high spatial frequency spectrum off-axis illumination".SCIENTIFIC REPORTS 5(2015). |
入库方式： OAI收割
来源：光电技术研究所
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