Nanolithography in the Evanescent Near Field by Using Nano-filmed Noble Metal Layers
文献类型：会议论文
| 作者 | Yang Y(杨勇) ; Hu S(胡松) ; Yao HM(姚汉民) |
| 出版日期 | 2008 |
| 会议名称 | PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS (SPIE) |
| 卷号 | 6724 |
| 中文摘要 | Nanolithography has been investigated by using optical proximity exposure in the evanescent near field in nano-filmed noble metals. Sub-diffraction-limited feature size can be resolved by using i-line illumination exposure. Compared with the model of original superlens, we separated the superlens 100nm away from the mask, under the illumination of i-line light, the initial simulation shows that the sub-diffraction-limited feature as small as 60nm linewidth with 120nm pitch can be clearly resolved without hard contact between mask and nano-filmed noble metal. By proper design of the materials and the parameters of nano-filmed layers, better resolution can be realized. |
| 收录类别 | 其他 |
| 语种 | 英语 |
| ISSN号 | 0361-0783 |
| 源URL | [http://ir.ioe.ac.cn/handle/181551/1824]  |
| 专题 | 光电技术研究所_微电子装备总体研究室（四室） |
| 推荐引用方式 GB/T 7714 | Yang Y,Hu S,Yao HM. Nanolithography in the Evanescent Near Field by Using Nano-filmed Noble Metal Layers[C]. 见:PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS (SPIE). |
入库方式： OAI收割
来源：光电技术研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。