Nanofabrication with controllable localization energy based on the interference modulation of surface plasmons
文献类型:期刊论文
作者 | Wei, XZ (Wei, Xingzhan) ; Du, CL (Du, Chunlei) ; Dong, XC (Dong, Xiaochun) ; Luo, XG (Luo, Xiangang) ; Deng, QL (Deng, Qiling) ; Zhang, YD (Zhang, Yudong) |
刊名 | OPTICS EXPRESS
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出版日期 | 2008 |
卷号 | 16期号:19页码:14404-14410 SEP 15 |
ISSN号 | 1094-4102 |
中文摘要 | A nanolithography technique based on the interference of surface plasmons (SPs) is proposed and demonstrated to modulate the localized exposure energy. The SP waves participating in interference are excited by two distinct structures, namely, the grating |
收录类别 | SCI ; EI |
语种 | 英语 |
公开日期 | 2015-12-24 |
源URL | [http://ir.ioe.ac.cn/handle/181551/1939] ![]() |
专题 | 光电技术研究所_微电子装备总体研究室(四室微光学) |
推荐引用方式 GB/T 7714 | Wei, XZ ,Du, CL ,Dong, XC ,et al. Nanofabrication with controllable localization energy based on the interference modulation of surface plasmons[J]. OPTICS EXPRESS,2008,16(19):14404-14410 SEP 15. |
APA | Wei, XZ ,Du, CL ,Dong, XC ,Luo, XG ,Deng, QL ,&Zhang, YD .(2008).Nanofabrication with controllable localization energy based on the interference modulation of surface plasmons.OPTICS EXPRESS,16(19),14404-14410 SEP 15. |
MLA | Wei, XZ ,et al."Nanofabrication with controllable localization energy based on the interference modulation of surface plasmons".OPTICS EXPRESS 16.19(2008):14404-14410 SEP 15. |
入库方式: OAI收割
来源:光电技术研究所
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