机构

• 长春光学精密机械与物... [1]

采集方式

• OAI收割 [1]

内容类型

• 会议论文 [1]

发表日期

• 2009 [1]

学科主题

筛选

浏览/检索结果: 共1条，第1-1条 帮助 条数/页： 5101520253035404550556065707580859095100 排序方式： 请选择提交时间升序提交时间降序题名升序题名降序作者升序作者降序发表日期升序发表日期降序 Design and tolerance analysis of compensator for high order aspheric surface testing (EI CONFERENCE) 会议论文  OAI收割 2009 International Conference on Optical Instruments and Technology - Optoelectronic Measurement Technology and Systems, October 19, 2009 - October 22, 2009, Shanghai, China 作者:  Chen X.;  Liu W.;  Chen X.;  Chen X. 收藏  |  浏览/下载：18/0  |  提交时间：2013/03/25 High accuracy is required in surface testing of 90nm nodal point lithography projecting lens. By comparing various aspheric surface testing methods  the structure layout of the compensator is a meniscus positive lens combined with a Plano-convex positive lens. The design results indicate that: primary and high order aberrations are balanced well  we adopt Offner null compensator to test the aspheric surface in the point diffraction interferometer at last. In this paper  MTF exceeds diffraction limit  an Offner compensator is presented on the base of the third order aberration theory to test concave aspheric surface  root-mean-square (RMS) of wave front error /167. The F-number of the system can achieve F/1.64. By the analysis of the process of aspheric surface testing with the designed system  the optical construction parameters of which is determined by introducing equal-quantities spherical aberration to compensate all orders of aspheric coefficients. The field of view of the system is 0.02  a loosen distribution of the tolerance was presented based on the accuracy of measuring apparatus. 2009 SPIE.