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	Theoretical research on parameter calculation and error analysis of Hindle auxiliary sphere method for testing convex hyperboloid mirror 会议论文 OAI收割 Beijing, China, 2021-7（23-25）作者: Jiao XJ(焦晓洁); Jiang ZB(姜自波) \| 收藏 \| 浏览/下载：45/0 \| 提交时间：2022/03/31 applied optics Hindle test error analysis Hindle auxiliary sphere convex hyperboloid mirror stitching detection
	Experimental study on hybrid compensation testing of an off-axis convex ellipsoid surface 期刊论文 OAI收割 Optics Express, 2019, 卷号: 27, 期号: 20, 页码: 27546-27561 作者: L.S.Yan; D.Y.Zhu; X.F.Zeng; M.Li; X.K.Wang \| 收藏 \| 浏览/下载：27/0 \| 提交时间：2020/08/24 stitching interferometry,subaperture,reconstruction,aspheres,error,Optics
	Ritchey-Common sparse-aperture testing of the Giant Steerable Science Mirror 期刊论文 OAI收割 Applied Optics, 2018, 卷号: 57, 期号: 27, 页码: 7764-7769 作者: An, Q. C.; Zhang, J. X.; Yang, F.; Zhao, H. C.; Cao, H. F. \| 收藏 \| 浏览/下载：13/0 \| 提交时间：2019/09/17 point-source sensitivity large telescopes stitching test error calibration Optics
	Experimental study on subaperture stitching testing of convex hyperboloid surface 期刊论文 OAI收割 Optics Communications, 2018, 卷号: 428, 页码: 104-109 作者: Zhu, D. Y.; Yan, L. S.; Wang, X. K.; Li, M. \| 收藏 \| 浏览/下载：12/0 \| 提交时间：2019/09/17 Interferometry Convex aspheric surfaces Stitching Non-null testing retrace error-correction aspheric surfaces large flat algorithm reconstruction Optics
	Test of an off-axis asphere by subaperture stitching interferometry (EI CONFERENCE) 会议论文 OAI收割 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, November 19, 2008 - November 21, 2008, Chengdu, China 作者: Zheng L.-G.; Zhang X.-J.; Zhang Z.-Y.; Zhang Z.-Y.; Deng W.-J. 收藏 \| 浏览/下载：52/0 \| 提交时间：2013/03/25 A new method combined subaperture stitching with interferometry(SSI) is introduced. It can test large and off-axis aspheric surfaces without the aid of other null optics. In this paper the basic principle and theory of the technique are analyzed. The synthetical optimization stitching model and effective stitching algorithm are established based on homogeneous coordinates transformation and simultaneous least-squares method. The software of SSI is devised and the prototype for testing of large aspheres by SSI is designed and developed. An off-axis asphere with the aperture of 376mm188mm is tested by this method. For comparison and validation and the difference of PV and RMS error between them is 0.047 e and 0.006 e the asphere is also tested by null compensation.The synthesized surface profile is consistent to that ofthe entire surface from null test respectively. So it provides another quantitative measurement for testing large aspheric surfaces and off-axis aspheres besides null-compensation. 2009 SPIE.
	Annular sub-aperture stitching interferometry for testing of large asphreical surfaces (EI CONFERENCE) 会议论文 OAI收割 International Symposium on Photoelectronic Detection and Imaging, ISPDI 2007: Optoelectronic System Design, Manufacturing, and Testings, September 9, 2007 - September 12, 2007, Beijing, China 作者: Zheng L.-G.; Zhang X.-J.; Deng W.-J.; Wang X.-K. 收藏 \| 浏览/下载：76/0 \| 提交时间：2013/03/25 Annular subaperture stitching interferometric technology can test large-aperture and the PV and RMS of residual error of the full aperture phase distribution is 0.027 and 0.0023 high numerical aperture aspheric surfaces with high resolution the relative error of PV and RMS is -0.53% and -0.31% respectively. The results conclude that this splicing model and algorithm are accurate and feasible. So it provides another quantitive measurement for test aspheric surfaces especially for large aperture aspheres besides null-compensation. low cost and high efficiency without auxiliary null optics. In this paper the basic principle and theory of the stitching method are introduced the reasonable mathematical model and effective splicing algorithm are established based on simultaneous least-squares method and Zernike polynomial fitting. The translation errors are eliminated from each subaperture through the synthetical optimization stitching mode it keeps the error from transmitting and accumulating. The numerical simulations have been carried on by this method. As results the surface map of the full aperture after stitching is consistent to the input surface map the difference of PV error and RMS error between them is -0.0074 and -0.00052 ( is 632.8nm) respectively
	Systematic considerations for the patterning of photonic crystal devices by electron beam lithography 期刊论文 iSwitch采集 Optics communications, 2007, 卷号: 271, 期号: 1, 页码: 241-247 作者: Yu, Hejun; Yu, Jinzhong; Sun, Fei; Li, Zhiyong; Chen, Shaowu 收藏 \| 浏览/下载：20/0 \| 提交时间：2019/05/12 Photonic crystal E-beam lithography Resist Stitching error Proximity effect correction