中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
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Farmland degradation caused by radial diffusion of CO2 leakage from carbon capture and storage 期刊论文  OAI收割
JOURNAL OF CLEANER PRODUCTION, 2020, 卷号: 255, 页码: 8
作者:  
Ma, Xin;  Zhang, Xueyan;  Tian, Di
  |  收藏  |  浏览/下载:19/0  |  提交时间:2020/05/19
Farmland degradation caused by radial diffusion of CO2 leakage from carbon capture and storage 期刊论文  OAI收割
JOURNAL OF CLEANER PRODUCTION, 2020, 卷号: 255, 页码: 8
作者:  
Ma, Xin
  |  收藏  |  浏览/下载:16/0  |  提交时间:2020/05/19
A degradation threshold for irreversible loss of soil productivity: a long-term case study in China SCI/SSCI论文  OAI收割
2011
作者:  
Gao Y.
收藏  |  浏览/下载:25/0  |  提交时间:2012/06/08
High power vertical cavity surface-emitting laser with high reliability (EI CONFERENCE) 会议论文  OAI收割
Optoelectronic Materials and Devices II, November 2, 2007 - November 5, 2007, Wuhan, China
Changling Y.; Guoguang L.; Chunfeng H.; Li Q.
收藏  |  浏览/下载:18/0  |  提交时间:2013/03/25
The effect of N/Si ratio on the a-SiiH/SiNx interface of a-SirH/SiNx TFT (EI CONFERENCE) 会议论文  OAI收割
Asia Display 2007, AD'07, March 12, 2007 - March 16, 2007, Shanghai, China
Liu J. e.; Gao W.; Liao Y.; Jing H.; Fu G.
收藏  |  浏览/下载:24/0  |  提交时间:2013/03/25
The threshold voltage of a-Si: H/SiNx TFT will shift under long time gate bias stress  it is mostly leaded by charge trapping in gate insulator and defect creation in semiconductor. And it is hard to be applied in AMOLED for TFT because of its threshold voltage shift. In allusion to the phenomenon of charge trapping  a series of SiNx insulating films in different N/Si(0. 87 -1.68) ratio were deposited by PECVD in this paper  controlling different flow ratio of source gas SiH4 and NH3  and a great deal of tests (ellipsometer  infrared absorption (FTIR) and Electron Dispersion Spectrum (EDS) test ) were done on these samples. Based on these SiNx insulators  three different capacitance samples in MIS structure were done  degraded experiments and C-V tests on these samples were done. The C-V curve shift of capacitance which contained SiNx with slightly N-rich(N/Si is bigger slightly than 1. 33) was not evident before and after degradation  this result indicated that the defect density of this type SiN x was smaller  and could restrain charge chapping in the interface of a-Si:H/SiNx effectively. So that as gate insulator of TFT  SiN x with slightly N-rich could decrease the threshold voltage shift of TFT and enhance its stability effectively.  
Effects of carbon nanotubes on processing stability of polyoxymethylene in melt-mixing process 期刊论文  OAI收割
Journal of Physical Chemistry C, 2007, 卷号: 111, 期号: 37, 页码: 13945-13950
Y. Zeng; Z. Ying; J. H. Du; H. M. Cheng
收藏  |  浏览/下载:25/0  |  提交时间:2012/04/13