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CAS IR Grid
机构
兰州化学物理研究所 [2]
长春光学精密机械与物... [1]
水生生物研究所 [1]
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期刊论文 [3]
会议论文 [1]
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2005 [1]
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Biotechnol... [1]
材料科学与物理化学 [1]
物理化学与绿色催化 [1]
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A two-pronged strategy to enhance visible-light-driven overall water splitting via visible-to-ultraviolet upconversion coupling with hydrogen-oxygen recombination inhibition
期刊论文
OAI收割
Applied Catalysis B: Environmental, 2017, 卷号: 212, 页码: 23-31
作者:
Gao W(高薇)
;
Zhang WY(张文妍)
;
Lu GX(吕功煊)
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  |  
浏览/下载:20/0
  |  
提交时间:2017/07/10
Visible-to-ultraviolet upconversion
Pr3+-Y2SiO5
CaTiO3 catalyst
Inhibition of hydrogen and oxygen
recombination
Overall water splitting
Visible light irradiation
紫外光辐照下钛硅共掺杂类金刚石薄膜微结构的演化
期刊论文
OAI收割
无机材料学报, 2014, 卷号: 29, 期号: 9, 页码: 941-946
作者:
姜金龙
;
王琼
;
黄浩
;
张霞
;
王玉宝
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  |  
浏览/下载:30/0
  |  
提交时间:2016/10/11
类金刚石薄膜
紫外光辐照
拉曼光谱
红外光谱
结构演化
diamond-like carbon film
ultraviolet light irradiation
Raman spectra
FTIR spectra
microstructural evolution
Fabrication of polysilicon thin film on glass with low-temperature UV-assisted crystallization (EI CONFERENCE)
会议论文
OAI收割
ICO20: Display Devices and Systems, August 21, 2005 - August 26, 2005, Changchun, China
Huang J. Y.
;
Ling Z. H.
;
Jing H.
;
Fu G. Z.
;
Zhao Y. H.
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浏览/下载:32/0
  |  
提交时间:2013/03/25
The amorphous silicon (a-Si) film was crystallized on glass by a simple method employed ultraviolet at temperatures as low as 400C. The employ of ultraviolet enhanced the crystallization of amorphous silicon. This method is able to uniformly crystallized large-area amorphous silicon films. The polysilicon films crystallized by this way are suitable for the fabrication of thin film transistors on ordinary glass. Crystallization process is performed in a furnace. Amorphous silicon sample is placed on a hot plate and irradiated by a bank of ultraviolet lamps through a diffuser plate to improve the uniformity of light that irradiates the sample. Raman microscopy is used for analyzing the qualities of UV-assisted crystallized silicon films. By measuring the Raman spectra the effects of anneal temperature and process time on the crystallizing behavior
crystallinity and grain size of the processed films were obtained. There has a threshold temperature for crystallization of amorphous silicon film in the presence of ultraviolet irradiation with certain intensity
i.e. by ultraviolet irradiation with certain intensity only when the temperature is up to the threshold temperature
the crystallization can be triggered. The threshold temperature is 400C when the intensity of ultraviolet irradiation is 1mW/cm2. Above threshold temperature
the increase of anneal temperature increased the rate of crystallization. Crystallinity and grain size extracted from Raman spectra of samples increase with the extending of process time at certain temperature. Crystallization of amorphous silicon film with thickness of 50nm completed within 6 hours at 400C irradiated by ultraviolet with intensity of 2mW/cm2.
Effects of solar UV radiation on morphology and photosynthesis of filamentous cyanobacterium Arthrospira platensis
期刊论文
OAI收割
APPLIED AND ENVIRONMENTAL MICROBIOLOGY, 2005, 卷号: 71, 期号: 9, 页码: 5004-5013
作者:
Wu, HY
;
Gao, KS
;
Villafane, VE
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浏览/下载:47/0
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提交时间:2010/10/13
ULTRAVIOLET-B RADIATION
INDUCED DNA-DAMAGE
BLUE-GREEN-ALGA
SPIRULINA-PLATENSIS
NITROGEN-METABOLISM
OZONE DEPLETION
LIGHT
IRRADIATION
REPAIR
PHOTOINHIBITION