Investigation of defects in sputtered W/B4C multilayers
文献类型：期刊论文
| 作者 | Jiang, H; Yan, S; Zhu, JT; Dong, ZH; Zheng, Y; He, YM; Li, AG |
| 刊名 | APPLIED SURFACE SCIENCE
 |
| 出版日期 | 2015 |
| 卷号 | 357页码:1180—1186 |
| 关键词 | ATOMIC-FORCE MICROSCOPY OPTICAL APPLICATIONS DIFFUSE-SCATTERING TUNGSTEN-OXIDE THIN-FILMS COATINGS REFLECTIVITY INTERFACE CRACKING STRESS |
| ISSN号 | 0169-4332 |
| 通讯作者 | Jiang, H (reprint author), Chinese Acad Sci, Shanghai Inst Appl Phys, Shanghai Synchrotron Radiat Facil, Zhangheng Rd 239, Shanghai 201204, Peoples R China. |
| 英文摘要 | Sputtered W/B4C multilayers were determined by X-ray photoelectron spectroscopy, Raman scattering spectroscopy, scanning electron microscopy and atomic force microscopy synthetically. Two defect modes were observed in multilayers: buckle delamination and oxidation. This paper compares the chemical composition varies along multilayer depth and at different regions and tries to interpret the mechanism of defect evolution. The X-ray grazing incidence reflection profiles were compared to the theoretical value to estimate the influences from different defects. (C) 2015 Elsevier B.V. All rights reserved. |
| 语种 | 英语 |
| WOS记录号 | WOS:000366216900153 |
| 公开日期 | 2016-03-08 |
| 源URL | [http://ir.sinap.ac.cn/handle/331007/24971]  |
| 专题 | 上海应用物理研究所_中科院上海应用物理研究所2011-2017年 |
| 推荐引用方式 GB/T 7714 | Jiang, H,Yan, S,Zhu, JT,et al. Investigation of defects in sputtered W/B4C multilayers[J]. APPLIED SURFACE SCIENCE,2015,357:1180—1186. |
| APA | Jiang, H.,Yan, S.,Zhu, JT.,Dong, ZH.,Zheng, Y.,...&Li, AG.(2015).Investigation of defects in sputtered W/B4C multilayers.APPLIED SURFACE SCIENCE,357,1180—1186. |
| MLA | Jiang, H,et al."Investigation of defects in sputtered W/B4C multilayers".APPLIED SURFACE SCIENCE 357(2015):1180—1186. |
入库方式： OAI收割
来源：上海应用物理研究所
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