中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Controllable cancer cell growth using UV patterned hydrogels via DMD-based modulating projection printing

文献类型:会议论文

作者Yang WG(杨文广); Yu HB(于海波); Wang YC(王越超); Liu LQ(刘连庆)
出版日期2015
会议名称15th IEEE International Conference on Nanotechnology, IEEE-NANO 2015
会议日期July 27-30, 2015
会议地点Rome, Italy
关键词cell pattern cell biology microfabrication cell adhesion rapid pattern
页码1410-1413
中文摘要Fabrication of cell growth environment in vitro to control the cell spatial arrangement and proliferation is an indispensable technique for cell-based technologies. Previously several developed micropatterning methods such as soft lithography required relatively complicated operations, which leads to difficulties in the following research to investigate the effects of different cell growth patterns. This manuscript introduces a DMD-based projection technique to quickly pattern a poly(ethylene) glycol diacrylate (PEGDA)-based hydrogel on common glass substrates, which were used to control the growth patterns of cells. Compared with other methods, employed with digital dynamic mask, polymerisation of PEGDA solution can be induced to create arbitrary shape microstructures with high efficiency, flexibility and repeatability. The time duration of UV exposure is less than 10 s by controlling the projected illumination pattern. The resistance to cell attachment enables patterned PEGDA-coated film to be employed to hinder cell adhesion while the blank area allowing cells to grow in various patterns and sizes.
收录类别EI ; CPCI(ISTP)
产权排序1
会议主办者Nanotechnology Council
会议录IEEE-NANO 2015 - 15th International Conference on Nanotechnology
会议录出版者IEEE
会议录出版地Piscataway, NJ, USA
语种英语
ISBN号978-1-4673-8155-0
WOS记录号WOS:000380515200282
源URL[http://ir.sia.cn/handle/173321/18611]  
专题沈阳自动化研究所_机器人学研究室
推荐引用方式
GB/T 7714
Yang WG,Yu HB,Wang YC,et al. Controllable cancer cell growth using UV patterned hydrogels via DMD-based modulating projection printing[C]. 见:15th IEEE International Conference on Nanotechnology, IEEE-NANO 2015. Rome, Italy. July 27-30, 2015.

入库方式: OAI收割

来源:沈阳自动化研究所

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