Off-line inspection method of microlens array for illumination homogenization in DUV lithography machine
文献类型：会议论文
| 作者 | Zhang Fang; Zhu Jing; Yang Baoxi; Huang Lihua; Hu Xiaobang; Xiao Yanfen; Huang Huijie |
| 出版日期 | 2013 |
| 会议名称 | international conference on optical instruments and technology - optoelectronic measurement technology and systems |
| 通讯作者 | huang, hj (reprint author), chinese acad sci, shanghai inst opt & fine mech, shanghai 201800, peoples r china. |
| 英文摘要 | illumination uniformity is one of the key specifications of lithography illumination system because of its strong influence on the critical dimension (cd) uniformity in optical lithography. refractive microlens array (mla) has been extensively adopted in lithography system to achieve highly homogeneous illumination field with less light loss relative to diffractive element. off-line homogenization inspection of the mla provides important data for entire system integration. it is still a challenge work to investigate the optical performance for such high-end mla with large clear aperture and high sensitivity to the incident light parameters. in order to address these issues, subaperture stitching method has been proposed to be applied and studied in this work. the feasibility of this method has been verified by theoretical simulation of a diffracting homogenizer. in the experiment, a corresponding optical setup is constructed, and a crossed-cylindrical single-plate mla has been tested. the experimental results are consistent with the simulation ones. it could be concluded that subaperture stitching method is a powerful method to evaluate the homogeneous performance of mla. |
| 收录类别 | CPCI |
| 会议录 | 2013 international conference on optical instruments and technology: optoelectronic measurement technology and systems
 |
| 会议录出版者 | spie-int soc optical engineering |
| 语种 | 英语 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/17265]  |
| 专题 | 上海光学精密机械研究所_信息光学与光电技术实验室 |
| 作者单位 | 1.[Zhang Fang 2.Zhu Jing 3.Yang Baoxi 4.Huang Lihua 5.Hu Xiaobang 6.Xiao Yanfen 7.Huang Huijie] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China |
| 推荐引用方式 GB/T 7714 | Zhang Fang,Zhu Jing,Yang Baoxi,et al. Off-line inspection method of microlens array for illumination homogenization in DUV lithography machine[C]. 见:international conference on optical instruments and technology - optoelectronic measurement technology and systems. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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