中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
A novel SU-8 nanofluidic chip fabrication technique based on traditional UV photolithography

文献类型:期刊论文

作者Yin ZF(殷志富); Lu BL(鲁伯林); Zou, Helin
刊名Microsystem Technologies
出版日期2017
页码1-7
ISSN号0946-7076
产权排序2
通讯作者殷志富
中文摘要Nanofluidic chips are becoming increasingly important for biological and chemical applications due to the special phenomena only occur in nanochannels. In this study, a simple and low-cost method for fabricating SU-8 nanofluidic chips is proposed based on traditional ultraviolet (UV) photolithography. The thermal-induced cracks (nanochannels) can be automatically formed by thermal stress release during the postbake process. The influence of pattern-shape, pattern-angle and pattern-distance on the maximum stress of the SU-8 patterns was investigated. And the effect of postbake temperature on the maximum stress of the SU-8 patterns was also analyzed. The numerical and experimental results show that when the triangle SU-8 patterns with pattern-angle of 60° is postbaked at 125 °C, the nanocracks can be easily formed between two patterns. With this newly developed technology, simple, low-cost and large scale nanofluidic chips can be fabricated only by traditional UV photolighography, which allows a commercially manufacturing of nano-components.
收录类别EI
语种英语
源URL[http://ir.sia.cn/handle/173321/19926]  
专题沈阳自动化研究所_智能检测与装备研究室
推荐引用方式
GB/T 7714
Yin ZF,Lu BL,Zou, Helin. A novel SU-8 nanofluidic chip fabrication technique based on traditional UV photolithography[J]. Microsystem Technologies,2017:1-7.
APA Yin ZF,Lu BL,&Zou, Helin.(2017).A novel SU-8 nanofluidic chip fabrication technique based on traditional UV photolithography.Microsystem Technologies,1-7.
MLA Yin ZF,et al."A novel SU-8 nanofluidic chip fabrication technique based on traditional UV photolithography".Microsystem Technologies (2017):1-7.

入库方式: OAI收割

来源:沈阳自动化研究所

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