A novel SU-8 nanofluidic chip fabrication technique based on traditional UV photolithography
文献类型:期刊论文
作者 | Yin ZF(殷志富); Lu BL(鲁伯林)![]() |
刊名 | Microsystem Technologies
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出版日期 | 2017 |
页码 | 1-7 |
ISSN号 | 0946-7076 |
产权排序 | 2 |
通讯作者 | 殷志富 |
中文摘要 | Nanofluidic chips are becoming increasingly important for biological and chemical applications due to the special phenomena only occur in nanochannels. In this study, a simple and low-cost method for fabricating SU-8 nanofluidic chips is proposed based on traditional ultraviolet (UV) photolithography. The thermal-induced cracks (nanochannels) can be automatically formed by thermal stress release during the postbake process. The influence of pattern-shape, pattern-angle and pattern-distance on the maximum stress of the SU-8 patterns was investigated. And the effect of postbake temperature on the maximum stress of the SU-8 patterns was also analyzed. The numerical and experimental results show that when the triangle SU-8 patterns with pattern-angle of 60° is postbaked at 125 °C, the nanocracks can be easily formed between two patterns. With this newly developed technology, simple, low-cost and large scale nanofluidic chips can be fabricated only by traditional UV photolighography, which allows a commercially manufacturing of nano-components. |
收录类别 | EI |
语种 | 英语 |
源URL | [http://ir.sia.cn/handle/173321/19926] ![]() |
专题 | 沈阳自动化研究所_智能检测与装备研究室 |
推荐引用方式 GB/T 7714 | Yin ZF,Lu BL,Zou, Helin. A novel SU-8 nanofluidic chip fabrication technique based on traditional UV photolithography[J]. Microsystem Technologies,2017:1-7. |
APA | Yin ZF,Lu BL,&Zou, Helin.(2017).A novel SU-8 nanofluidic chip fabrication technique based on traditional UV photolithography.Microsystem Technologies,1-7. |
MLA | Yin ZF,et al."A novel SU-8 nanofluidic chip fabrication technique based on traditional UV photolithography".Microsystem Technologies (2017):1-7. |
入库方式: OAI收割
来源:沈阳自动化研究所
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