Fabrication of Sub-Micrometer-Sized MoS2 Thin-Film Transistor by Phase Mode AFM Lithography
文献类型：期刊论文
| 作者 | Yu P(于鹏)3 ; Li GY(李广勇)4; Li M(李萌)1,3; Shi JL(施佳林)3; Liu LQ(刘连庆)3; Yang T(杨铁)3
|
| 刊名 | Small
 |
| 出版日期 | 2018 |
| 卷号 | 14期号:49页码:1-6 |
| 关键词 | AFM lithography MoS2 TFT fabrication |
| ISSN号 | 1613-6810 |
| 产权排序 | 1 |
| 英文摘要 | The phase mode atomic force microscopy (AFM) lithography and monolayer lift-off process are combined to fabricate electronics based on 2D materials (2DMs), which remove the need for pre-fabricating markers and increase the accuracy of the overlay and alignment. The promising phase mode of AFM lithography eliminates the drawbacks of the conventional force mode such as the over-cut, under-cut, debris effect, and severe tip wear. The planar size of MoS2 thin-film transistors is shrunken down to sub-micrometer by the proposed method, and the fabricated devices demonstrate n-type characteristics. It offers a more flexible and easier way to fabricate prototypes of sub-micrometer-sized 2DMs based devices, and gives the opportunity to explore the size effect on the performance of 2DMs devices. |
| WOS关键词 | FIELD-EFFECT TRANSISTORS ; ATOMIC-FORCE MICROSCOPY ; METAL NANOWIRES ; MOBILITY |
| 资助项目 | National Natural Science Foundation of China[61522312] ; National Natural Science Foundation of China[61433017] ; National Natural Science Foundation of China[U1613220] ; CAS FEA International Partnership Program for Creative Research Teams |
| WOS研究方向 | Chemistry ; Science & Technology - Other Topics ; Materials Science ; Physics |
| 语种 | 英语 |
| WOS记录号 | WOS:000456503600013 |
| 资助机构 | National Natural Science Foundation of China ; CAS FEA International Partnership Program for Creative Research Teams |
| 源URL | [http://ir.sia.cn/handle/173321/22818]  |
| 专题 | 沈阳自动化研究所_机器人学研究室 |
| 通讯作者 | Liu LQ(刘连庆) |
| 作者单位 | 1.University of Chinese Academy of Science, Beijing 100049, China 2.15213, United States 3.State Key Laboratory of Robotics, Shenyang Institute of Automation, Chinese Academy of Science, Shenyang 110016, China 4.Department of Electrical and Computer Engineering, University of Pittsburgh, Pittsburgh, PA |
| 推荐引用方式 GB/T 7714 | Yu P,Li GY,Li M,et al. Fabrication of Sub-Micrometer-Sized MoS2 Thin-Film Transistor by Phase Mode AFM Lithography[J]. Small,2018,14(49):1-6. |
| APA | Yu P,Li GY,Li M,Shi JL,Liu LQ,&Yang T.(2018).Fabrication of Sub-Micrometer-Sized MoS2 Thin-Film Transistor by Phase Mode AFM Lithography.Small,14(49),1-6. |
| MLA | Yu P,et al."Fabrication of Sub-Micrometer-Sized MoS2 Thin-Film Transistor by Phase Mode AFM Lithography".Small 14.49(2018):1-6. |
入库方式： OAI收割
来源：沈阳自动化研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。