Pattern density dependence of thermal deformation of extreme ultraviolet mask and its impact on full field lithography performance
文献类型：期刊论文
| 作者 | Li, Yanqiu; Zhou, Pengfei; Fei, Zhang |
| 刊名 | Japanese journal of applied physics part 1-regular papers brief communications & review papers
 |
| 出版日期 | 2007-08-01 |
| 卷号 | 46期号:8a页码:5104-5111 |
| 关键词 | Euvl Mask Optics Thermal deformation Next generation of lithography |
| ISSN号 | 0021-4922 |
| DOI | 10.1143/jjap.46.5104 |
| 通讯作者 | Li, yanqiu(yanqiuli@hotmail.com) |
| 英文摘要 | Full field lithography performance of production extreme ultraviolet lithography (euvl) toot has been studied when thermal deformation of mask and projection optics (po) can not be neglected at 45 nm node. the thermal deformation of a philosophic design of euv mask with certain local pattern density had been analyzed. the results show that thermal management is needed. the lithography performance of deformed euvl system is degraded significantly due to the maximum pattern placement error of 5.9 nm on the wafer, consequently result in poor overlay accuracy. the results indicate that thermal deformation of system result in a tight role of system design, mask and resist technology. |
| WOS关键词 | OPTICAL RETICLES ; EXPOSURE |
| WOS研究方向 | Physics |
| WOS类目 | Physics, Applied |
| 语种 | 英语 |
| WOS记录号 | WOS:000248814100021 |
| 出版者 | INST PURE APPLIED PHYSICS |
| URI标识 | http://www.irgrid.ac.cn/handle/1471x/2380001 |
| 专题 | 中国科学院大学 |
| 通讯作者 | Li, Yanqiu |
| 作者单位 | 1.Beijing Inst Technol, Beijing 100081, Peoples R China 2.Chinese Acad Sci, Inst Elect Engn, Beijing 100080, Peoples R China 3.Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China |
| 推荐引用方式 GB/T 7714 | Li, Yanqiu,Zhou, Pengfei,Fei, Zhang. Pattern density dependence of thermal deformation of extreme ultraviolet mask and its impact on full field lithography performance[J]. Japanese journal of applied physics part 1-regular papers brief communications & review papers,2007,46(8a):5104-5111. |
| APA | Li, Yanqiu,Zhou, Pengfei,&Fei, Zhang.(2007).Pattern density dependence of thermal deformation of extreme ultraviolet mask and its impact on full field lithography performance.Japanese journal of applied physics part 1-regular papers brief communications & review papers,46(8a),5104-5111. |
| MLA | Li, Yanqiu,et al."Pattern density dependence of thermal deformation of extreme ultraviolet mask and its impact on full field lithography performance".Japanese journal of applied physics part 1-regular papers brief communications & review papers 46.8a(2007):5104-5111. |
入库方式： iSwitch采集
来源：中国科学院大学
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。