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Mocvd growth of inn using a gan buffer

文献类型:期刊论文

作者Wang, L. L.; Wang, H.; Chen, J.; Sun, X.; Zhu, J. J.; Jiang, D. S.; Yang, H.; Liang, J. W.
刊名Superlattices and microstructures
出版日期2008-02-01
卷号43期号:2页码:81-85
关键词Surface X-ray diffraction Electrical properties Metalorganic chemical vapour deposition Inn
ISSN号0749-6036
DOI10.1016/j.spmi.2007.06.008
通讯作者Wang, l. l.(wangll@red.semi.ac.cn)
英文摘要We have investigated mocvd growth of inn oil sapphire with and without a gan buffer between 490 and 520 degrees c. the buffer significantly improves the surface morphological uniformity and electrical properties of inn epilayers. characterization of the as-grown epilayers with the buffer reveals that kinetics-limited islands are formed at lower temperatures, whereas islands with equilibrium shape are obtained at higher temperatures. below 520 degrees c, increasing temperature improves structural quality but degrades electrical properties. hall data from this study suggest that v-n-related defects/impurities are the possible donor species and compensation varies with charged dislocation acceptors. we believe that reducing carrier concentration and dislocation density is effective to increase the hall mobility of inn. (c) 2007 elsevier ltd. all rights reserved.
WOS关键词EPITAXY ; ENERGY ; DONOR
WOS研究方向Physics
WOS类目Physics, Condensed Matter
语种英语
WOS记录号WOS:000258520300002
出版者ACADEMIC PRESS LTD ELSEVIER SCIENCE LTD
URI标识http://www.irgrid.ac.cn/handle/1471x/2427446
专题半导体研究所
通讯作者Wang, L. L.
作者单位Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Wang, L. L.,Wang, H.,Chen, J.,et al. Mocvd growth of inn using a gan buffer[J]. Superlattices and microstructures,2008,43(2):81-85.
APA Wang, L. L..,Wang, H..,Chen, J..,Sun, X..,Zhu, J. J..,...&Liang, J. W..(2008).Mocvd growth of inn using a gan buffer.Superlattices and microstructures,43(2),81-85.
MLA Wang, L. L.,et al."Mocvd growth of inn using a gan buffer".Superlattices and microstructures 43.2(2008):81-85.

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来源:半导体研究所

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