中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Growth of (10(1)over-bar(3)over-bar) semipolar gan on m-plane sapphire by hydride vapor phase epitaxy

文献类型:期刊论文

作者Wei, T. B.; Hu, Q.; Duan, R. F.; Wei, X. C.; Huo, Z. Q.; Wang, J. X.; Zeng, Y. P.; Wang, G. H.; Li, J. M.
刊名Journal of crystal growth
出版日期2009-08-15
卷号311期号:17页码:4153-4157
关键词Hrxrd Pl Stacking fault Hvpe Gan Semipolar
ISSN号0022-0248
DOI10.1016/j.jcrysgro.2009.06.058
通讯作者Wei, t. b.(tbwei@semi.ac.cn)
英文摘要The crystalline, surface, and optical properties of the (10 (1) over bar(3) over bar) semipolar gan directly grown on m-plane sapphire substrates by hydride vapor phase epitaxy (hvpe) were investigated. it was found that the increase of v/iii ratio led to high quality (10 (1) over bar(3) over bar) oriented gan epilayers with a morphology that may have been produced by step-flow growth and with minor evidence of anisotropic crystalline structure. after etching in the mixed acids, the inclined pyramids dominated the gan surface with a density of 2 x 10(5) cm(-2), revealing the n-polarity characteristic. in the low-temperature pl spectra, weak bsf-related emission at 3.44ev could be observed as a shoulder of donor-bound exciton lines for the epilayer at high v/iii ratio, which was indicative of obvious reduction of bsfs density. in comparison with other defect related emissions, a different quenching behavior was found for the 3.29 ev emission, characterized by the temperature-dependent pl measurement. (c) 2009 elsevier b.v. all rights reserved.
WOS关键词LIGHT-EMITTING-DIODES ; FREESTANDING GAN ; GALLIUM NITRIDE ; RECOMBINATION ; FILMS
WOS研究方向Crystallography ; Materials Science ; Physics
WOS类目Crystallography ; Materials Science, Multidisciplinary ; Physics, Applied
语种英语
WOS记录号WOS:000269992200001
出版者ELSEVIER SCIENCE BV
URI标识http://www.irgrid.ac.cn/handle/1471x/2427641
专题半导体研究所
通讯作者Wei, T. B.
作者单位Chinese Acad Sci, Inst Semicond, Semicond Lighting Technol Res & Dev Ctr, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Wei, T. B.,Hu, Q.,Duan, R. F.,et al. Growth of (10(1)over-bar(3)over-bar) semipolar gan on m-plane sapphire by hydride vapor phase epitaxy[J]. Journal of crystal growth,2009,311(17):4153-4157.
APA Wei, T. B..,Hu, Q..,Duan, R. F..,Wei, X. C..,Huo, Z. Q..,...&Li, J. M..(2009).Growth of (10(1)over-bar(3)over-bar) semipolar gan on m-plane sapphire by hydride vapor phase epitaxy.Journal of crystal growth,311(17),4153-4157.
MLA Wei, T. B.,et al."Growth of (10(1)over-bar(3)over-bar) semipolar gan on m-plane sapphire by hydride vapor phase epitaxy".Journal of crystal growth 311.17(2009):4153-4157.

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来源:半导体研究所

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