中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Selenium-doped silicon-on-insulator waveguide photodetector with enhanced sensitivity at 1550 nm

文献类型:期刊论文

作者Mao, Xue; Han, Peide; Gao, Lipeng; Mi, Yanhong; Hu, Shaoxu; Fan, Yujie; Zhao, Chunhua; Wang, Qiming
刊名Ieee photonics technology letters
出版日期2011-10-15
卷号23期号:20页码:3
关键词Deep level, photodetector Responses at subbandgap wavelength Selenium ion implantation Silicon waveguide
ISSN号1041-1135
DOI10.1109/lpt.2011.2163704
通讯作者Mao, xue(maoxue@semi.ac.cn)
英文摘要This letter describes the fabrication and characterization of a silicon-on-insulator all silicon rib waveguide photodetector with sensitivity at 1550 nm. response at the subbandgap wavelength is provided through the introduction of deep levels via se ion implantation. se ions were implanted into the waveguide using an ion beam energy of 240 kev at a dose of 3 x 10(15) cm(-2) the most efficient device has a responsivity of 25 ma/w at 3 v reverse bias. the fabrication is fully compatible with standard complementary metal-oxide-semiconductor processes.
WOS关键词ION-IMPLANTATION ; POWER MONITOR ; PHOTODIODES
WOS研究方向Engineering ; Optics ; Physics
WOS类目Engineering, Electrical & Electronic ; Optics ; Physics, Applied
语种英语
WOS记录号WOS:000298952900019
出版者IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
URI标识http://www.irgrid.ac.cn/handle/1471x/2428298
专题半导体研究所
通讯作者Mao, Xue
作者单位Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Mao, Xue,Han, Peide,Gao, Lipeng,et al. Selenium-doped silicon-on-insulator waveguide photodetector with enhanced sensitivity at 1550 nm[J]. Ieee photonics technology letters,2011,23(20):3.
APA Mao, Xue.,Han, Peide.,Gao, Lipeng.,Mi, Yanhong.,Hu, Shaoxu.,...&Wang, Qiming.(2011).Selenium-doped silicon-on-insulator waveguide photodetector with enhanced sensitivity at 1550 nm.Ieee photonics technology letters,23(20),3.
MLA Mao, Xue,et al."Selenium-doped silicon-on-insulator waveguide photodetector with enhanced sensitivity at 1550 nm".Ieee photonics technology letters 23.20(2011):3.

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来源:半导体研究所

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