中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Infrared transition properties of vanadium dioxide thin films across semiconductor-metal transition

文献类型:期刊论文

作者Liang Jiran1,2; Hu Ming1; Kan Qiang2; Liang Xiuqin3; Wang Xiaodong3; Li Guike4; Chen Hongda2
刊名Rare metals
出版日期2011-06-01
卷号30期号:3页码:247-251
关键词Vanadium dioxide Infrared transition Diffraction effect Dual ion beam sputtering Annealing
ISSN号1001-0521
DOI10.1007/s12598-011-0376-4
通讯作者Liang jiran(liang_jiran@tju.edu.cn)
英文摘要Vanadium dioxide thin films were fabricated through annealing vanadium oxide thin films deposited by dual ion beam sputtering. x-ray diffraction (xrd), atom force microscopy (afm), and fourier transform infrared spectrum (ftir) were employed to measure the crystalline structure, surface morphology, and infrared optical transmittance. the phase transition properties were characterized by transmittance. the results show that the annealed vanadium oxide thin film is composed of monoclinic vo(2), with preferred orientation of (011). the maximum of transmittance change is beyond 65% as the temperature increases from 20 to 80a degrees c. the reversible changes in optical transmittance against temperature were observed. the change rate of transmittance at short wavelength is higher than that at long wavelength at the same temperature across semiconductor-metal phase transition. this phenomenon was discussed using diffraction effect.
WOS研究方向Materials Science ; Metallurgy & Metallurgical Engineering
WOS类目Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering
语种英语
WOS记录号WOS:000291059800007
出版者NONFERROUS METALS SOC CHINA
URI标识http://www.irgrid.ac.cn/handle/1471x/2428442
专题半导体研究所
通讯作者Liang Jiran
作者单位1.Tianjin Univ, Sch Elect & Informat Technol, Tianjin 300072, Peoples R China
2.Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R China
3.Chinese Acad Sci, Inst Semicond, Engn Res Ctr Semicond Integrated Technol, Beijing 100083, Peoples R China
4.Chinese Acad Sci, Inst Semicond, State Key Lab Super Lattices & Microstruct, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Liang Jiran,Hu Ming,Kan Qiang,et al. Infrared transition properties of vanadium dioxide thin films across semiconductor-metal transition[J]. Rare metals,2011,30(3):247-251.
APA Liang Jiran.,Hu Ming.,Kan Qiang.,Liang Xiuqin.,Wang Xiaodong.,...&Chen Hongda.(2011).Infrared transition properties of vanadium dioxide thin films across semiconductor-metal transition.Rare metals,30(3),247-251.
MLA Liang Jiran,et al."Infrared transition properties of vanadium dioxide thin films across semiconductor-metal transition".Rare metals 30.3(2011):247-251.

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来源:半导体研究所

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