Effect of Cryogenic Temperature Characteristic on 0.18μm Silicon-on-insulator Devices
文献类型:期刊论文
作者 | Li BH(李彬鸿)![]() ![]() ![]() ![]() ![]() ![]() |
刊名 | Chinese Physics B
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出版日期 | 2016-06-01 |
英文摘要 | The experimental results of the cryogenic temperature characteristics on 0.18- m silicon-on-insulator (SOI) metaloxide-silicon (MOS) field-effect-transistors (FETs) were presented in detail. The current and capacitance characteristics for different operating conditions ranging from 300 K to 10 K were discussed. SOI MOSFETs at cryogenic temperature exhibit improved performance, as expected. Nevertheless, operation at cryogenic temperature also demonstrates abnormal behaviors, such as the impur··· |
源URL | [http://159.226.55.106/handle/172511/16157] ![]() |
专题 | 微电子研究所_硅器件与集成研发中心 |
作者单位 | 中国科学院微电子研究所 |
推荐引用方式 GB/T 7714 | Li BH,Luo JJ,Li B,et al. Effect of Cryogenic Temperature Characteristic on 0.18μm Silicon-on-insulator Devices[J]. Chinese Physics B,2016. |
APA | Li BH.,Luo JJ.,Li B.,Bi JS.,Bu JH.,...&Han ZS.(2016).Effect of Cryogenic Temperature Characteristic on 0.18μm Silicon-on-insulator Devices.Chinese Physics B. |
MLA | Li BH,et al."Effect of Cryogenic Temperature Characteristic on 0.18μm Silicon-on-insulator Devices".Chinese Physics B (2016). |
入库方式: OAI收割
来源:微电子研究所
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