中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Effect of Cryogenic Temperature Characteristic on 0.18μm Silicon-on-insulator Devices

文献类型:期刊论文

作者Li BH(李彬鸿); Luo JJ(罗家俊); Li B(李博); Bi JS(毕津顺); Bu JH(卜建辉); Wu C(吴驰); Han ZS(韩郑生)
刊名Chinese Physics B
出版日期2016-06-01
英文摘要

The experimental results of the cryogenic temperature characteristics on 0.18- m silicon-on-insulator (SOI) metaloxide-silicon (MOS) field-effect-transistors (FETs) were presented in detail. The current and capacitance characteristics for different operating conditions ranging from 300 K to 10 K were discussed. SOI MOSFETs at cryogenic temperature exhibit improved performance, as expected. Nevertheless, operation at cryogenic temperature also demonstrates abnormal behaviors, such as the impur···

源URL[http://159.226.55.106/handle/172511/16157]  
专题微电子研究所_硅器件与集成研发中心
作者单位中国科学院微电子研究所
推荐引用方式
GB/T 7714
Li BH,Luo JJ,Li B,et al. Effect of Cryogenic Temperature Characteristic on 0.18μm Silicon-on-insulator Devices[J]. Chinese Physics B,2016.
APA Li BH.,Luo JJ.,Li B.,Bi JS.,Bu JH.,...&Han ZS.(2016).Effect of Cryogenic Temperature Characteristic on 0.18μm Silicon-on-insulator Devices.Chinese Physics B.
MLA Li BH,et al."Effect of Cryogenic Temperature Characteristic on 0.18μm Silicon-on-insulator Devices".Chinese Physics B (2016).

入库方式: OAI收割

来源:微电子研究所

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