Effect of concentration on the position of uorescence peak based on blacksilicon SERS substrate
文献类型：期刊论文
| 作者 | Yuan Y(远雁); Li CB(李超波); Liu LH(刘丽花); Cui SH(崔绍晖); Fu TZ(符庭钊) |
| 刊名 | Applied surface science
 |
| 出版日期 | 2018-09-12 |
| 文献子类 | 期刊论文 |
| 源URL | [http://159.226.55.107/handle/172511/19049]  |
| 专题 | 微电子研究所_微电子仪器设备研发中心 |
| 推荐引用方式 GB/T 7714 | Yuan Y,Li CB,Liu LH,et al. Effect of concentration on the position of uorescence peak based on blacksilicon SERS substrate[J]. Applied surface science,2018. |
| APA | 远雁,李超波,刘丽花,崔绍晖,&符庭钊.(2018).Effect of concentration on the position of uorescence peak based on blacksilicon SERS substrate.Applied surface science. |
| MLA | 远雁,et al."Effect of concentration on the position of uorescence peak based on blacksilicon SERS substrate".Applied surface science (2018). |
入库方式： OAI收割
来源：微电子研究所
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