Modeling of Front-Etched Micromachined Thermopile IR Detector by CMOS Technology
文献类型:期刊论文
作者 | Xu, DH ; Xiong, B ; Wang, YL |
刊名 | JOURNAL OF MICROELECTROMECHANICAL SYSTEMS
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出版日期 | 2010 |
卷号 | 19期号:6页码:1331-1340 |
关键词 | STATE TEMPERATURE DISTRIBUTION THERMOELECTRIC SENSORS MICROSENSORS OPTIMIZATION PERFORMANCE MEMS |
ISSN号 | 1057-7157 |
通讯作者 | Xu, DH, Chinese Acad Sci, Sci & Technol Microsyst Lab, State Key Lab Transducer Technol, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China |
学科主题 | Engineering, Electrical & Electronic; Engineering, Mechanical |
收录类别 | SCI |
语种 | 英语 |
公开日期 | 2011-12-17 |
源URL | [http://ir.sim.ac.cn/handle/331004/38360] ![]() |
专题 | 上海微系统与信息技术研究所_微系统技术_期刊论文 |
推荐引用方式 GB/T 7714 | Xu, DH,Xiong, B,Wang, YL. Modeling of Front-Etched Micromachined Thermopile IR Detector by CMOS Technology[J]. JOURNAL OF MICROELECTROMECHANICAL SYSTEMS,2010,19(6):1331-1340. |
APA | Xu, DH,Xiong, B,&Wang, YL.(2010).Modeling of Front-Etched Micromachined Thermopile IR Detector by CMOS Technology.JOURNAL OF MICROELECTROMECHANICAL SYSTEMS,19(6),1331-1340. |
MLA | Xu, DH,et al."Modeling of Front-Etched Micromachined Thermopile IR Detector by CMOS Technology".JOURNAL OF MICROELECTROMECHANICAL SYSTEMS 19.6(2010):1331-1340. |
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