中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Modeling of Front-Etched Micromachined Thermopile IR Detector by CMOS Technology

文献类型:期刊论文

作者Xu, DH ; Xiong, B ; Wang, YL
刊名JOURNAL OF MICROELECTROMECHANICAL SYSTEMS
出版日期2010
卷号19期号:6页码:1331-1340
关键词STATE TEMPERATURE DISTRIBUTION THERMOELECTRIC SENSORS MICROSENSORS OPTIMIZATION PERFORMANCE MEMS
ISSN号1057-7157
通讯作者Xu, DH, Chinese Acad Sci, Sci & Technol Microsyst Lab, State Key Lab Transducer Technol, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China
学科主题Engineering, Electrical & Electronic; Engineering, Mechanical
收录类别SCI
语种英语
公开日期2011-12-17
源URL[http://ir.sim.ac.cn/handle/331004/38360]  
专题上海微系统与信息技术研究所_微系统技术_期刊论文
推荐引用方式
GB/T 7714
Xu, DH,Xiong, B,Wang, YL. Modeling of Front-Etched Micromachined Thermopile IR Detector by CMOS Technology[J]. JOURNAL OF MICROELECTROMECHANICAL SYSTEMS,2010,19(6):1331-1340.
APA Xu, DH,Xiong, B,&Wang, YL.(2010).Modeling of Front-Etched Micromachined Thermopile IR Detector by CMOS Technology.JOURNAL OF MICROELECTROMECHANICAL SYSTEMS,19(6),1331-1340.
MLA Xu, DH,et al."Modeling of Front-Etched Micromachined Thermopile IR Detector by CMOS Technology".JOURNAL OF MICROELECTROMECHANICAL SYSTEMS 19.6(2010):1331-1340.

入库方式: OAI收割

来源:上海微系统与信息技术研究所

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