Integrated micromachined thermopile IR detectors with an XeF2 dry-etching process
文献类型：期刊论文
| 作者 | Xu, DH ; Xiong, B ; Wang, YL ; Liu, MF ; Li, T |
| 刊名 | JOURNAL OF MICROMECHANICS AND MICROENGINEERING
 |
| 出版日期 | 2009 |
| 卷号 | 19期号:12页码:125003-125003 |
| 关键词 | CMOS SENSORS SILICON SI |
| ISSN号 | 0960-1317 |
| 通讯作者 | Xu, DH, Chinese Acad Sci, State Key Lab Transducer Technol, Shanghai Inst Microsyst & Informat Technol, 865 Changning Rd, Shanghai 200050, Peoples R China |
| 学科主题 | Engineering, Electrical & Electronic; Nanoscience & Nanotechnology; Instruments & Instrumentation; Materials Science, Multidisciplinary; Mechanics |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2011-12-17 |
| 源URL | [http://ir.sim.ac.cn/handle/331004/38445]  |
| 专题 | 上海微系统与信息技术研究所_微系统技术_期刊论文 |
| 推荐引用方式 GB/T 7714 | Xu, DH,Xiong, B,Wang, YL,et al. Integrated micromachined thermopile IR detectors with an XeF2 dry-etching process[J]. JOURNAL OF MICROMECHANICS AND MICROENGINEERING,2009,19(12):125003-125003. |
| APA | Xu, DH,Xiong, B,Wang, YL,Liu, MF,&Li, T.(2009).Integrated micromachined thermopile IR detectors with an XeF2 dry-etching process.JOURNAL OF MICROMECHANICS AND MICROENGINEERING,19(12),125003-125003. |
| MLA | Xu, DH,et al."Integrated micromachined thermopile IR detectors with an XeF2 dry-etching process".JOURNAL OF MICROMECHANICS AND MICROENGINEERING 19.12(2009):125003-125003. |
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