Post-CMOS micromachined nickel tunable-capacitors with a large tuning-range under low actuating voltage
文献类型：期刊论文
| 作者 | Gu, L ; Wu, ZZ ; Li, XX |
| 刊名 | MICROWAVE AND OPTICAL TECHNOLOGY LETTERS
 |
| 出版日期 | 2008 |
| 卷号 | 50期号:9页码:2469-2472 |
| 关键词 | RF-MEMS |
| ISSN号 | 0895-2477 |
| 通讯作者 | Li, XX, Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Transducer Technol, Shanghai 200050, Peoples R China |
| 学科主题 | Engineering, Electrical & Electronic; Optics |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2011-12-17 |
| 源URL | [http://ir.sim.ac.cn/handle/331004/38533]  |
| 专题 | 上海微系统与信息技术研究所_微系统技术_期刊论文 |
| 推荐引用方式 GB/T 7714 | Gu, L,Wu, ZZ,Li, XX. Post-CMOS micromachined nickel tunable-capacitors with a large tuning-range under low actuating voltage[J]. MICROWAVE AND OPTICAL TECHNOLOGY LETTERS,2008,50(9):2469-2472. |
| APA | Gu, L,Wu, ZZ,&Li, XX.(2008).Post-CMOS micromachined nickel tunable-capacitors with a large tuning-range under low actuating voltage.MICROWAVE AND OPTICAL TECHNOLOGY LETTERS,50(9),2469-2472. |
| MLA | Gu, L,et al."Post-CMOS micromachined nickel tunable-capacitors with a large tuning-range under low actuating voltage".MICROWAVE AND OPTICAL TECHNOLOGY LETTERS 50.9(2008):2469-2472. |
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