Study on ultra-thin NEMS cantilevers - High yield fabrication and size-effect on Young's modulus of silicon
文献类型：期刊论文
| 作者 | Li, XX ; Ono, T ; Wang, YL ; Esashi, M |
| 刊名 | FIFTEENTH IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS, TECHNICAL DIGEST
 |
| 出版日期 | 2002 |
| 页码 | 427-430 |
| 关键词 | SENSITIVITY |
| ISSN号 | 1084-6999 |
| 通讯作者 | Li, XX, Chinese Acad Sci, Shanghai Inst Met, State Key Lab Transducer Technol, Shanghai 200050, Peoples R China |
| 学科主题 | Engineering, Electrical & Electronic; Engineering, Mechanical; Robotics; Optics |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2011-12-17 |
| 源URL | [http://ir.sim.ac.cn/handle/331004/38757]  |
| 专题 | 上海微系统与信息技术研究所_微系统技术_期刊论文 |
| 推荐引用方式 GB/T 7714 | Li, XX,Ono, T,Wang, YL,et al. Study on ultra-thin NEMS cantilevers - High yield fabrication and size-effect on Young's modulus of silicon[J]. FIFTEENTH IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS, TECHNICAL DIGEST,2002:427-430. |
| APA | Li, XX,Ono, T,Wang, YL,&Esashi, M.(2002).Study on ultra-thin NEMS cantilevers - High yield fabrication and size-effect on Young's modulus of silicon.FIFTEENTH IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS, TECHNICAL DIGEST,427-430. |
| MLA | Li, XX,et al."Study on ultra-thin NEMS cantilevers - High yield fabrication and size-effect on Young's modulus of silicon".FIFTEENTH IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS, TECHNICAL DIGEST (2002):427-430. |
入库方式： OAI收割
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。