Resonance enhancement of micromachined resonators with strong mechanical-coupling between two degrees of freedom
文献类型：期刊论文
| 作者 | Li, XX ; Ono, T ; Lin, RM ; Esashi, M |
| 刊名 | MICROELECTRONIC ENGINEERING
 |
| 出版日期 | 2003 |
| 卷号 | 65期号:1-2页码:1-12 |
| 关键词 | POLYSILICON |
| ISSN号 | 0167-9317 |
| 通讯作者 | Li, XX, Chinese Acad Sci, Shanghai Inst Met, State Key Lab Transducer Technol, 865 Changning Rd, Shanghai 200050, Peoples R China |
| 学科主题 | Engineering, Electrical & Electronic; Nanoscience & Nanotechnology; Optics; Physics, Applied |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2011-12-17 |
| 源URL | [http://ir.sim.ac.cn/handle/331004/38752]  |
| 专题 | 上海微系统与信息技术研究所_微系统技术_期刊论文 |
| 推荐引用方式 GB/T 7714 | Li, XX,Ono, T,Lin, RM,et al. Resonance enhancement of micromachined resonators with strong mechanical-coupling between two degrees of freedom[J]. MICROELECTRONIC ENGINEERING,2003,65(1-2):1-12. |
| APA | Li, XX,Ono, T,Lin, RM,&Esashi, M.(2003).Resonance enhancement of micromachined resonators with strong mechanical-coupling between two degrees of freedom.MICROELECTRONIC ENGINEERING,65(1-2),1-12. |
| MLA | Li, XX,et al."Resonance enhancement of micromachined resonators with strong mechanical-coupling between two degrees of freedom".MICROELECTRONIC ENGINEERING 65.1-2(2003):1-12. |
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