中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Suspended Photoresist Thin Film for Fabrication of Through Silicon Vias

文献类型:期刊论文

作者Wu,ZY ; Yang,H ; Dou,CG ; Wu,YH ; Li,XX ; Wang,YL
刊名IEEE TRANSACTIONS ON COMPONENTS PACKAGING AND MANUFACTURING TECHNOLOGY
出版日期2011
卷号1期号:9页码:1345-1349
关键词IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
ISSN号2156-3950
学科主题Engineering ; Manufacturing; Engineering ; Electrical & Electronic; Materials Science ; Multidisciplinary
公开日期2012-04-12
源URL[http://ir.sim.ac.cn/handle/331004/106936]  
专题上海微系统与信息技术研究所_微系统技术_期刊论文
推荐引用方式
GB/T 7714
Wu,ZY,Yang,H,Dou,CG,et al. Suspended Photoresist Thin Film for Fabrication of Through Silicon Vias[J]. IEEE TRANSACTIONS ON COMPONENTS PACKAGING AND MANUFACTURING TECHNOLOGY,2011,1(9):1345-1349.
APA Wu,ZY,Yang,H,Dou,CG,Wu,YH,Li,XX,&Wang,YL.(2011).Suspended Photoresist Thin Film for Fabrication of Through Silicon Vias.IEEE TRANSACTIONS ON COMPONENTS PACKAGING AND MANUFACTURING TECHNOLOGY,1(9),1345-1349.
MLA Wu,ZY,et al."Suspended Photoresist Thin Film for Fabrication of Through Silicon Vias".IEEE TRANSACTIONS ON COMPONENTS PACKAGING AND MANUFACTURING TECHNOLOGY 1.9(2011):1345-1349.

入库方式: OAI收割

来源:上海微系统与信息技术研究所

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