Neural Network Predictive R2R Control to CMP Process
文献类型：会议论文
| 作者 | Wang L(王亮); Hu JT(胡静涛)
|
| 出版日期 | 2011 |
| 会议名称 | 2011 4th IEEE International Conference on Computer Science and Information Technology |
| 会议日期 | June 10-12, 2011 |
| 会议地点 | Chengdu, China |
| 关键词 | chemical mechanical polishing RBF neural network predictive control run-to-run control PSO rolling optimization |
| 页码 | 9-13 |
| 中文摘要 | For chemical mechanical polishing(CMP)process characteristics of nonlinear, time-varying and not being in-situ measured, this paper proposes a CMP process neural network predictive run-to-run(R2R) controller named NNPR2R. RBF neural network predictive model about CMP is constructed by subtractive clustering algorithm and least squares method, thus it solves difficult problem of constructing accurate mathematical model of complicated CMP process and improves the prediction accuracy. Control law of model predictive control is obtained by feedback correction and PSO rolling optimization, therefore it solves the problem that derivative-based optimization technology is easy to fall into local optimum and improves control precision. Simulation results illustrate that performance of NNPR2R controller is better than EWMA, process drifts and shifts is suppressed significantly, product quality variation between different runs is reduced, and root mean squared error for material removal rate(MRR) is brought down substantially. |
| 产权排序 | 1 |
| 会议主办者 | IEEE |
| 会议录 | 2011 4th IEEE International Conference on Computer Science and Information Technology
 |
| 会议录出版者 | IEEE |
| 会议录出版地 | Piscataway, NJ |
| 语种 | 英语 |
| ISBN号 | 978-1-61284-836-5 |
| 源URL | [http://ir.sia.cn/handle/173321/8376]  |
| 专题 | 沈阳自动化研究所_工业信息学研究室 |
| 推荐引用方式 GB/T 7714 | Wang L,Hu JT. Neural Network Predictive R2R Control to CMP Process[C]. 见:2011 4th IEEE International Conference on Computer Science and Information Technology. Chengdu, China. June 10-12, 2011. |
入库方式： OAI收割
来源：沈阳自动化研究所
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