Fabrication of Micrometer-and Nanometer-scale Polymer Structures by Visible Light Induced Dielectrophoresis (DEP) Force
文献类型：期刊论文
| 作者 | Wang SE(王淑娥); Liang WF(梁文峰); Dong ZL(董再励) ; Lee, V.G.B.; Li WJ(李文荣)
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| 刊名 | Micromachines
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| 出版日期 | 2011 |
| 卷号 | 2期号:4页码:431-442 |
| 关键词 | 3D polymer structures ODEP chip optically-induced DEP micro-/nano-scale polymer structures polymer fabrication |
| ISSN号 | 2072-666X |
| 产权排序 | 1 |
| 中文摘要 | We report in this paper a novel, inexpensive and flexible method for fabricating micrometerand nanometer-scale three-dimensional (3D) polymer structures using visible light sources instead of ultra-violet (UV) light sources or lasers. This method also does not require the conventional micro-photolithographic technique (i.e., photolithographic masks) for patterning and fabricating polymer structures such as hydrogels. The major materials and methods required for this novel fabrication technology are: (1) any cross-linked network of photoactive polymers (examples of fabricated poly(ethylene glycol) (PEG)-diacrylate hydrogel structures are shown in this paper); (2) an Optically-induced Dielectrophoresis (ODEP) System which includes an "ODEP chip" (i.e., any chip that changes its surface conductivity when exposed to visible light), an optical microscope, a projector, and a computer; and (3) an animator software hosted on a computer that can generate virtual or dynamic patterns which can be projected onto the "ODEP chip" through the use of a projector and a condenser lens. Essentially, by placing a photosensitive polymer solution inside the microfluidic platform formed by the "ODEP chip" bonded to another substrate, and applying an alternating current (a.c.) electrical potential across the polymer solution (typically ~20 Vp-pat 10 kHz), solid polymer micro/nano structures can then be formed on the "ODEP chip" surface when visible-light is projected onto the chip. The 2D lateral geometry (x and y dimensions) and the thickness (height) of the micro/nano structures are dictated by the image geometry of the visible light projected onto the "ODEP chip" and also the time duration of projection. Typically, after an image projection with intensity ranging from ~0.2 to 0.4 mW/cm for 10 s, ~200 nm high structures can be formed. In our current system, the thickness of these polymer structures can be controlled to form from ~200 nanometers to ~3 micrometers structures. However, in the in-plane dimensions, only ~7 mum resolution can be achieved now, due to the optical diffraction limit and the physical dimensions of DMD mirrors in the projector. Nevertheless, with higher quality optical components, the in-plane resolution is expected to be sub-micron. |
| WOS标题词 | Science & Technology ; Technology |
| 类目[WOS] | Nanoscience & Nanotechnology ; Instruments & Instrumentation |
| 研究领域[WOS] | Science & Technology - Other Topics ; Instruments & Instrumentation |
| 收录类别 | SCI ; EI |
| 语种 | 英语 |
| WOS记录号 | WOS:000208781900005 |
| 公开日期 | 2012-05-29 |
| 源URL | [http://ir.sia.cn/handle/173321/7350]  |
| 专题 | 沈阳自动化研究所_机器人学研究室 |
| 推荐引用方式 GB/T 7714 | Wang SE,Liang WF,Dong ZL,et al. Fabrication of Micrometer-and Nanometer-scale Polymer Structures by Visible Light Induced Dielectrophoresis (DEP) Force[J]. Micromachines,2011,2(4):431-442. |
| APA | Wang SE,Liang WF,Dong ZL,Lee, V.G.B.,&Li WJ.(2011).Fabrication of Micrometer-and Nanometer-scale Polymer Structures by Visible Light Induced Dielectrophoresis (DEP) Force.Micromachines,2(4),431-442. |
| MLA | Wang SE,et al."Fabrication of Micrometer-and Nanometer-scale Polymer Structures by Visible Light Induced Dielectrophoresis (DEP) Force".Micromachines 2.4(2011):431-442. |
入库方式： OAI收割
来源：沈阳自动化研究所
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