中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Development of deep reactive ion etching and Cu electroplating of tapered via for 3D integration

文献类型:期刊论文

作者Chen, Xiao ; Tang, Jiajie ; Xu, Gaowei ; Luo, Le
刊名ICEPT-HDP 2011 Proceedings - 2011 International Conference on Electronic Packaging Technology and High Density Packaging.ICEPT-HDP 2011 Proceedings - 2011 International Conference on Electronic Packaging Technology and High Density Packaging
出版日期2011
页码65-67
通讯作者Chen, X.(chenxiao@mail.sim.ac.cn)
收录类别EI-160
语种英语
公开日期2012-08-23
源URL[http://ir.sim.ac.cn/handle/331004/109207]  
专题上海微系统与信息技术研究所_微系统技术_期刊论文
推荐引用方式
GB/T 7714
Chen, Xiao,Tang, Jiajie,Xu, Gaowei,et al. Development of deep reactive ion etching and Cu electroplating of tapered via for 3D integration[J]. ICEPT-HDP 2011 Proceedings - 2011 International Conference on Electronic Packaging Technology and High Density Packaging.ICEPT-HDP 2011 Proceedings - 2011 International Conference on Electronic Packaging Technology and High Density Packaging,2011:65-67.
APA Chen, Xiao,Tang, Jiajie,Xu, Gaowei,&Luo, Le.(2011).Development of deep reactive ion etching and Cu electroplating of tapered via for 3D integration.ICEPT-HDP 2011 Proceedings - 2011 International Conference on Electronic Packaging Technology and High Density Packaging.ICEPT-HDP 2011 Proceedings - 2011 International Conference on Electronic Packaging Technology and High Density Packaging,65-67.
MLA Chen, Xiao,et al."Development of deep reactive ion etching and Cu electroplating of tapered via for 3D integration".ICEPT-HDP 2011 Proceedings - 2011 International Conference on Electronic Packaging Technology and High Density Packaging.ICEPT-HDP 2011 Proceedings - 2011 International Conference on Electronic Packaging Technology and High Density Packaging (2011):65-67.

入库方式: OAI收割

来源:上海微系统与信息技术研究所

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