中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
High Q Single Crystal Silicon Micromechanical Resonators With Hybrid Etching Process

文献类型:期刊论文

作者Wu, GQ ; Xu, DH ; Xiong, B ; Wang, YL
刊名IEEE SENSORS JOURNAL
出版日期2012
卷号12期号:7页码:2414-2415
关键词Dry release fabrication hybrid etching micromechanical resonators pre-etched cavity
ISSN号1530-437X
通讯作者Wu, GQ (reprint author), Chinese Acad Sci, Grad Sch, Beijing 100039, Peoples R China.
中文摘要This letter presents a hybrid silicon etching-based technique for single crystal silicon micromechanical resonators fabrication. The proposed method differs from previous works by combining a front-side wet anisotropic pre-etching and a front-side DRIE dr
学科主题Engineering; Instruments & Instrumentation; Physics
收录类别2012SCI-098
原文出处10.1109/JSEN.2012.2191772
语种英语
公开日期2013-04-23
源URL[http://ir.sim.ac.cn/handle/331004/114911]  
专题上海微系统与信息技术研究所_微系统技术_期刊论文
推荐引用方式
GB/T 7714
Wu, GQ,Xu, DH,Xiong, B,et al. High Q Single Crystal Silicon Micromechanical Resonators With Hybrid Etching Process[J]. IEEE SENSORS JOURNAL,2012,12(7):2414-2415.
APA Wu, GQ,Xu, DH,Xiong, B,&Wang, YL.(2012).High Q Single Crystal Silicon Micromechanical Resonators With Hybrid Etching Process.IEEE SENSORS JOURNAL,12(7),2414-2415.
MLA Wu, GQ,et al."High Q Single Crystal Silicon Micromechanical Resonators With Hybrid Etching Process".IEEE SENSORS JOURNAL 12.7(2012):2414-2415.

入库方式: OAI收割

来源:上海微系统与信息技术研究所

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