High Q Single Crystal Silicon Micromechanical Resonators With Hybrid Etching Process
文献类型:期刊论文
作者 | Wu, GQ ; Xu, DH ; Xiong, B ; Wang, YL |
刊名 | IEEE SENSORS JOURNAL
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出版日期 | 2012 |
卷号 | 12期号:7页码:2414-2415 |
关键词 | Dry release fabrication hybrid etching micromechanical resonators pre-etched cavity |
ISSN号 | 1530-437X |
通讯作者 | Wu, GQ (reprint author), Chinese Acad Sci, Grad Sch, Beijing 100039, Peoples R China. |
中文摘要 | This letter presents a hybrid silicon etching-based technique for single crystal silicon micromechanical resonators fabrication. The proposed method differs from previous works by combining a front-side wet anisotropic pre-etching and a front-side DRIE dr |
学科主题 | Engineering; Instruments & Instrumentation; Physics |
收录类别 | 2012SCI-098 |
原文出处 | 10.1109/JSEN.2012.2191772 |
语种 | 英语 |
公开日期 | 2013-04-23 |
源URL | [http://ir.sim.ac.cn/handle/331004/114911] ![]() |
专题 | 上海微系统与信息技术研究所_微系统技术_期刊论文 |
推荐引用方式 GB/T 7714 | Wu, GQ,Xu, DH,Xiong, B,et al. High Q Single Crystal Silicon Micromechanical Resonators With Hybrid Etching Process[J]. IEEE SENSORS JOURNAL,2012,12(7):2414-2415. |
APA | Wu, GQ,Xu, DH,Xiong, B,&Wang, YL.(2012).High Q Single Crystal Silicon Micromechanical Resonators With Hybrid Etching Process.IEEE SENSORS JOURNAL,12(7),2414-2415. |
MLA | Wu, GQ,et al."High Q Single Crystal Silicon Micromechanical Resonators With Hybrid Etching Process".IEEE SENSORS JOURNAL 12.7(2012):2414-2415. |
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