中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Method of forming current confinement channels in semiconductor devices

文献类型:专利

作者DIXON, RICHARD W.; JOYCE, WILLIAM B.; KOSZI, LOUIS A.; MILLER, RICHARD C.; SCHWARTZ, BERTRAM
发表日期1985-05-07
专利号US4514896
著作权人AT&T BELL LABORATORIES
国家美国
文献子类授权发明
其他题名Method of forming current confinement channels in semiconductor devices
英文摘要Semiconductor light emitting devices, lasers and LEDs, are described in which the current flow channel is narrower near the top surface of the device and wider at its bottom near the active region. Also, described are several attenuation masks for fabricating the channels of these devices by particle bombardment.
公开日期1985-05-07
申请日期1984-01-17
状态失效
源URL[http://ir.opt.ac.cn/handle/181661/45773]  
专题半导体激光器专利数据库
作者单位AT&T BELL LABORATORIES
推荐引用方式
GB/T 7714
DIXON, RICHARD W.,JOYCE, WILLIAM B.,KOSZI, LOUIS A.,et al. Method of forming current confinement channels in semiconductor devices. US4514896. 1985-05-07.

入库方式: OAI收割

来源:西安光学精密机械研究所

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