In situ GISAXS study on the temperature-dependent performance of multilayer monochromators from the liquid nitrogen cooling temperature to 600 degrees C
文献类型：期刊论文
| 作者 | Jiang, H; Hua, WQ; Tian, NX; Li, AG; Li, XH; He, YM; Zhang, ZY |
| 刊名 | APPLIED SURFACE SCIENCE
 |
| 出版日期 | 2020 |
| 卷号 | 508页码:- |
| 关键词 | X-RAY REFLECTION SILICON MONOCHROMATOR ROUGHNESS INTERFACE GROWTH SCATTERING MIRRORS |
| ISSN号 | 0169-4332 |
| DOI | 10.1016/j.apsusc.2019.144838 |
| 文献子类 | 期刊论文 |
| 英文摘要 | With the extensive demands of high-flux beamlines for current or planned synchrotron radiation sources, it is important to use multilayer monochromators for beamlines with insertion devices to select required quasi-monochromatic beams. Few studies have reported the interface evolution of multilayer monochromators in the liquid nitrogen (LN2) cooling environment under intense white beam irradiation. In this research, an in situ grazing-incidence small-angle X-ray scattering (GISAXS) setup was designed to monitor different interface characteristics of Ru/C, Cr/C, W/Si, and Ni/Ti multilayers from the LN2 temperature to 600 degrees C. The temperature treatment was executed in three steps - (i) the long-term low-temperature treatment, (ii) the quick temperature variation treatments, and (iii) the high-temperature treatment. A surface profiler was also used to determine the lower-frequency surface roughness after different temperature treatments. The temperature-dependent performances of multilayers were analyzed along the layer deposition direction and the out-of-plane direction. Scattering along the deposition direction reveals different interface features of the multilayers based on their thermal expansions. The power spectral density curve fitting proves that the fractal exponent is very sensitive to temperature change. Most of multilayers have a lower fractal exponent at the LN2 temperature. Moreover, clear interfacial changes were observed in Ru/C and Ni/Ti multilayers during high-temperature treatments. |
| 语种 | 英语 |
| 源URL | [http://ir.sinap.ac.cn/handle/331007/32926]  |
| 专题 | 上海应用物理研究所_中科院上海应用物理研究所2011-2017年 |
| 作者单位 | 1.Chinese Acad Sci, Shanghai Inst Appl Phys, Jialuo Rd 2019, Shanghai 201800, Peoples R China 2.Chinese Acad Sci, Shanghai Adv Res Inst, Shanghai Synchrotron Radiat Facil, Zhangheng Rd 239, Shanghai 201204, Peoples R China |
| 推荐引用方式 GB/T 7714 | Jiang, H,Hua, WQ,Tian, NX,et al. In situ GISAXS study on the temperature-dependent performance of multilayer monochromators from the liquid nitrogen cooling temperature to 600 degrees C[J]. APPLIED SURFACE SCIENCE,2020,508:-. |
| APA | Jiang, H.,Hua, WQ.,Tian, NX.,Li, AG.,Li, XH.,...&Zhang, ZY.(2020).In situ GISAXS study on the temperature-dependent performance of multilayer monochromators from the liquid nitrogen cooling temperature to 600 degrees C.APPLIED SURFACE SCIENCE,508,-. |
| MLA | Jiang, H,et al."In situ GISAXS study on the temperature-dependent performance of multilayer monochromators from the liquid nitrogen cooling temperature to 600 degrees C".APPLIED SURFACE SCIENCE 508(2020):-. |
入库方式： OAI收割
来源：上海应用物理研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。