Direct Writing of Silicon Oxide Nanopatterns Using Photonic Nanojets
文献类型:期刊论文
作者 | Luo H(罗昊)1,2,3; Yu HB(于海波)1,3; Wen YD(文扬东)1,3; Zheng JC(郑建辰)1,2,3; Wang XD(王晓朵)1,3; Liu LQ(刘连庆)1,3 |
刊名 | PHOTONICS |
出版日期 | 2021 |
卷号 | 8期号:5页码:1-8 |
ISSN号 | 2304-6732 |
关键词 | femtosecond laser processing photonics nanojet nanometer-scale pattern semiconductor materials |
产权排序 | 1 |
英文摘要 | The ability to create controllable patterns of micro- and nanostructures on the surface of bulk silicon has widespread application potential. In particular, the direct writing of silicon oxide patterns on silicon via femtosecond laser-induced silicon amorphization has attracted considerable attention owing to its simplicity and high efficiency. However, the direct writing of nanoscale resolution is challenging due to the optical diffraction effect. In this study, we propose a highly efficient, one-step method for preparing silicon oxide nanopatterns on silicon. The proposed method combines femtosecond laser-induced silicon amorphization with a subwavelength-scale beam waist of photonic nanojets. We demonstrate the direct writing of arbitrary nanopatterns via contactless scanning, achieving patterns with a minimum feature size of 310 nm and a height of 120 nm. The proposed method shows potential for the fabrication of multifunctional surfaces, silicon-based chips, and silicon photonics. |
WOS关键词 | FEMTOSECOND LASER-ABLATION ; RESOLUTION |
资助项目 | National Natural Science Foundation of China[61925307] ; National Natural Science Foundation of China[61727811] ; National Natural Science Foundation of China[61973298] ; National Natural Science Foundation of China[61803366] ; National Natural Science Foundation of China[61821005] ; External Cooperation Program of the Chinese Academy of Sciences[173321KYSB20170015] ; CAS Interdisciplinary Innovation Team[JCTD-2019-09] ; Liaoning Revitalization Talents Program[XLYC1807006] ; Youth Innovation Promotion Association of the Chinese Academy of Sciences[Y201943] |
WOS研究方向 | Optics |
语种 | 英语 |
WOS记录号 | WOS:000654444700001 |
资助机构 | National Natural Science Foundation of ChinaNational Natural Science Foundation of China (NSFC) [61925307, 61727811, 61973298, 61803366, 61821005] ; External Cooperation Program of the Chinese Academy of SciencesChinese Academy of Sciences [173321KYSB20170015] ; CAS Interdisciplinary Innovation Team [JCTD-2019-09] ; Liaoning Revitalization Talents Program [XLYC1807006] ; Youth Innovation Promotion Association of the Chinese Academy of Sciences [Y201943] |
源URL | [http://ir.sia.cn/handle/173321/28913] |
专题 | 沈阳自动化研究所_机器人学研究室 |
通讯作者 | Yu HB(于海波); Liu LQ(刘连庆) |
作者单位 | 1.State Key Laboratory of Robotics, Shenyang Institute of Automation, Chinese Academy of Sciences, Shenyang 110016, China 2.University of Chinese Academy of Sciences, Beijing 100049, China 3.Institutes for Robotics and Intelligent Manufacturing, Chinese Academy of Sciences, Shenyang 110016, China |
推荐引用方式 GB/T 7714 | Luo H,Yu HB,Wen YD,et al. Direct Writing of Silicon Oxide Nanopatterns Using Photonic Nanojets[J]. PHOTONICS,2021,8(5):1-8. |
APA | Luo H,Yu HB,Wen YD,Zheng JC,Wang XD,&Liu LQ.(2021).Direct Writing of Silicon Oxide Nanopatterns Using Photonic Nanojets.PHOTONICS,8(5),1-8. |
MLA | Luo H,et al."Direct Writing of Silicon Oxide Nanopatterns Using Photonic Nanojets".PHOTONICS 8.5(2021):1-8. |
入库方式: OAI收割
来源:沈阳自动化研究所
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