中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Nanowire gate-all-around MOSFETs modeling: ballistic transport incorporating the source-to-drain tunneling

文献类型:期刊论文

作者Cheng H(程贺)1,2; Liu TF(刘铁锋)1,2; Zhang C(张超)1,2; Liu ZF(刘志峰)1,2; Yang ZJ(杨志家)1,2; Nakazato, Kazuo3; Zhang ZP(张志鹏)1,2
刊名Japanese Journal of Applied Physics
出版日期2020
卷号59期号:7页码:1-9
关键词ballistic transport cylindrical gate-allaround (GAA) MOSFET compact model Wentzel-Kramers-Brillouin (WKB) approximation the source-to-drain tunneling
ISSN号0021-4922
产权排序1
英文摘要

Incorporating the source-to-drain tunneling current that is valid in all operating regions, an analytical compact model is proposed in this paper for cylindrical ballistic gate-all-around n-type metal-oxide-semiconductor field-effect transistors with ultra-short silicon channel. From taking the drain-induced barrier lowering effect into consideration, the potential distribution within the device channel has been modeled based upon a 2D analysis in our previous work. In this study, by introducing a parabolic function when modeling the potential profile in the channel direction, we found out that the source-to-drain tunneling effect in the subthreshold region could be evaluated analytically by applying Wentzel-Kramers-Brillouin approximation. Then, it is practical to estimate the ballistic drain current for all operating regions analytically with this compact model considering both the source-to-drain tunneling and thermionic transport. The resulting analytic compact model is tested against non-equilibrium Green's function simulation using SILVACO, and good accuracy is demonstrated. Finally, we perform an NMOS inverter circuit simulation using HSPICE, when introducing our model to it as a Verilog-A script.

WOS关键词COMPACT MODEL ; SENSITIVITY
资助项目science and technology program of Liaoning[2019JH1/1010022]
WOS研究方向Physics
语种英语
WOS记录号WOS:000545683700001
资助机构The Science and Technology Program of Liaoning, the Major Industrial Projects (Grant No. 2019JH1/1010022)
源URL[http://ir.sia.cn/handle/173321/27325]  
专题沈阳自动化研究所_工业控制网络与系统研究室
通讯作者Zhang ZP(张志鹏)
作者单位1.State Key Lab of Robotics, Key Lab of Networked Control Systems, Shenyang Institute of Automation, 333Chinese Academy of Sciences, Shenyang 110016, China
2.Institutes for Robotics and Intelligent Manufacturing, Chinese Academy of Sciences, Shenyang 110016, China
3.Facility of Incubation, Nagoya University, Furo-cho, Nagoya, Aichi 464-8603, Japan
推荐引用方式
GB/T 7714
Cheng H,Liu TF,Zhang C,et al. Nanowire gate-all-around MOSFETs modeling: ballistic transport incorporating the source-to-drain tunneling[J]. Japanese Journal of Applied Physics,2020,59(7):1-9.
APA Cheng H.,Liu TF.,Zhang C.,Liu ZF.,Yang ZJ.,...&Zhang ZP.(2020).Nanowire gate-all-around MOSFETs modeling: ballistic transport incorporating the source-to-drain tunneling.Japanese Journal of Applied Physics,59(7),1-9.
MLA Cheng H,et al."Nanowire gate-all-around MOSFETs modeling: ballistic transport incorporating the source-to-drain tunneling".Japanese Journal of Applied Physics 59.7(2020):1-9.

入库方式: OAI收割

来源:沈阳自动化研究所

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