Nanowire gate-all-around MOSFETs modeling: ballistic transport incorporating the source-to-drain tunneling
文献类型:期刊论文
| 作者 | Cheng H(程贺)1,2; Liu TF(刘铁锋)1,2 ; Zhang C(张超)1,2 ; Liu ZF(刘志峰)1,2 ; Yang ZJ(杨志家)1,2 ; Nakazato, Kazuo3; Zhang ZP(张志鹏)1,2
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| 刊名 | Japanese Journal of Applied Physics
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| 出版日期 | 2020 |
| 卷号 | 59期号:7页码:1-9 |
| 关键词 | ballistic transport cylindrical gate-allaround (GAA) MOSFET compact model Wentzel-Kramers-Brillouin (WKB) approximation the source-to-drain tunneling |
| ISSN号 | 0021-4922 |
| 产权排序 | 1 |
| 英文摘要 | Incorporating the source-to-drain tunneling current that is valid in all operating regions, an analytical compact model is proposed in this paper for cylindrical ballistic gate-all-around n-type metal-oxide-semiconductor field-effect transistors with ultra-short silicon channel. From taking the drain-induced barrier lowering effect into consideration, the potential distribution within the device channel has been modeled based upon a 2D analysis in our previous work. In this study, by introducing a parabolic function when modeling the potential profile in the channel direction, we found out that the source-to-drain tunneling effect in the subthreshold region could be evaluated analytically by applying Wentzel-Kramers-Brillouin approximation. Then, it is practical to estimate the ballistic drain current for all operating regions analytically with this compact model considering both the source-to-drain tunneling and thermionic transport. The resulting analytic compact model is tested against non-equilibrium Green's function simulation using SILVACO, and good accuracy is demonstrated. Finally, we perform an NMOS inverter circuit simulation using HSPICE, when introducing our model to it as a Verilog-A script. |
| WOS关键词 | COMPACT MODEL ; SENSITIVITY |
| 资助项目 | science and technology program of Liaoning[2019JH1/1010022] |
| WOS研究方向 | Physics |
| 语种 | 英语 |
| WOS记录号 | WOS:000545683700001 |
| 资助机构 | The Science and Technology Program of Liaoning, the Major Industrial Projects (Grant No. 2019JH1/1010022) |
| 源URL | [http://ir.sia.cn/handle/173321/27325] ![]() |
| 专题 | 沈阳自动化研究所_工业控制网络与系统研究室 |
| 通讯作者 | Zhang ZP(张志鹏) |
| 作者单位 | 1.State Key Lab of Robotics, Key Lab of Networked Control Systems, Shenyang Institute of Automation, 333Chinese Academy of Sciences, Shenyang 110016, China 2.Institutes for Robotics and Intelligent Manufacturing, Chinese Academy of Sciences, Shenyang 110016, China 3.Facility of Incubation, Nagoya University, Furo-cho, Nagoya, Aichi 464-8603, Japan |
| 推荐引用方式 GB/T 7714 | Cheng H,Liu TF,Zhang C,et al. Nanowire gate-all-around MOSFETs modeling: ballistic transport incorporating the source-to-drain tunneling[J]. Japanese Journal of Applied Physics,2020,59(7):1-9. |
| APA | Cheng H.,Liu TF.,Zhang C.,Liu ZF.,Yang ZJ.,...&Zhang ZP.(2020).Nanowire gate-all-around MOSFETs modeling: ballistic transport incorporating the source-to-drain tunneling.Japanese Journal of Applied Physics,59(7),1-9. |
| MLA | Cheng H,et al."Nanowire gate-all-around MOSFETs modeling: ballistic transport incorporating the source-to-drain tunneling".Japanese Journal of Applied Physics 59.7(2020):1-9. |
入库方式: OAI收割
来源:沈阳自动化研究所
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