中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Improvement of Passivation Quality by Post-Crystallization Treatments with Different Methods for High Quality Tunnel Oxide Passivated Contact c-Si Solar Cells

文献类型:会议论文

作者Zhang, Zhi; Zeng, Yuheng; Huang, Yuqing; Guo, Xueqi; Wang, Zhixue; Yang, Qing; Shou, Chunhui; Yan, Baojie; Ye, Jichun
出版日期2019
会议日期JUN 16-21, 2019
关键词SILICON TEMPERATURE
英文摘要We report a systematic study of the post-crystallization treatment effects on the passivation quality of tunnel oxide passivated contact (TOPCon) on n-type CZ c-Si wafers with different methods, including thermal annealing in forming gas, and moisture carried by nitrogen, as well as capping with atomic layer deposition (ALD) Al2O3 and plasma-enhanced chemical vapor deposition (PECVD) SiNx:H following a thermal annealing in nitrogen. We found that the annealing at a moderate temperature of similar to 450 degrees C within a mixture of nitrogen and moisture is an effective way for improving the passivation quality, with which a high quality passivation with an implied open circuit voltage (iV(oc)) of 729 mV is achieved. A hydrogen containing capping layer with ALD Al2O3 on the poly-Si contact layer is found to be the most effective way for improving the passivation, with which an outstanding passivation quality with an iV(oc) of 747 mV, effective life time (tau(eff)) of 4.07 ms (Delta n = 5.0x10(15) cm(-3)), and single-side saturated recombination current density (J(0)) of 1.9 fA/cm(2) is attainted. Using the optimized TOPCon passivation layer on solar grade CZ wafers, we achieved a solar cell efficiency of 22.2%.
会议录出版者IEEE Photovoltaic Specialists Conference
学科主题Energy & Fuels ; Engineering
ISSN号0160-8371
ISBN号978-1-7281-0494-2
源URL[http://ir.nimte.ac.cn/handle/174433/23298]  
专题会议专题
会议专题_会议论文
推荐引用方式
GB/T 7714
Zhang, Zhi,Zeng, Yuheng,Huang, Yuqing,et al. Improvement of Passivation Quality by Post-Crystallization Treatments with Different Methods for High Quality Tunnel Oxide Passivated Contact c-Si Solar Cells[C]. 见:. JUN 16-21, 2019.

入库方式: OAI收割

来源:宁波材料技术与工程研究所

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