Local structural changes induced by ion bombardment in magnetron sputtered ZnO: Al films: Raman, XPS, and XAS study
文献类型:会议论文
| 作者 | Meng, Fanping; Ge, Fangfang; Chen, Yuyun; Xu, Genbao; Huang, Feng |
| 出版日期 | 2019 |
| 会议日期 | OCT 17-20, 2017 |
| 关键词 | X-RAY-ABSORPTION ELECTRONIC-STRUCTURE SPECTROSCOPY OXIDE SCATTERING GA |
| 卷号 | 365 |
| DOI | 10.1016/j.surfcoat.2018.04.013 |
| 英文摘要 | Negative oxygen (O-) ions in the sputter deposition of oxides play a non-negligible role in determining their structures as well as physical properties. Knowledge of bombardment by O- ions induced local disorder in magnetron sputtered ZnO: Al (AZO) films is of fundamental interesting whereas that is currently limited. Here we report our initial results of the local structural changes characterized by a combination of Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), and X-ray absorption spectroscopy (XAS). The bombardment conditions during the film deposition was varied through changing the discharge voltage (i.e., vertical bar V-d vertical bar = 80-220 V) and the substrate positions (i.e., center or erosion region of the target). We found that highly-energetic O- ions bombardment induced a coexistence of various point defects such as oxygen vacancies (V-O), oxygen interstitials (O-i), and zinc interstitials (Zn-i). The concentration of these defects and thus the local disorder can be noticeably reduced through decreasing the vertical bar V-d vertical bar down to a sufficient low level. These results can be used to further optimize the growth processes to achieve the ZnO-based and related thin films with a high structural order. |
| 学科主题 | Materials Science ; Physics |
| ISSN号 | 0257-8972 |
| 源URL | [http://ir.nimte.ac.cn/handle/174433/23338] ![]() |
| 专题 | 会议专题 会议专题_会议论文 |
| 推荐引用方式 GB/T 7714 | Meng, Fanping,Ge, Fangfang,Chen, Yuyun,et al. Local structural changes induced by ion bombardment in magnetron sputtered ZnO: Al films: Raman, XPS, and XAS study[C]. 见:. OCT 17-20, 2017. |
入库方式: OAI收割
来源:宁波材料技术与工程研究所
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