Structure of uniform and high-quality Al-doped ZnO films by magnetron sputter deposition at low temperatures
文献类型：会议论文
| 作者 | Meng, Fanping; Peng, Shou; Xu, Genbao; Wang, Yun; Ge, Fangfang; Huang, Feng |
| 出版日期 | 2018 |
| 会议日期 | APR 23-27, 2018 |
| 关键词 | THIN-FILMS ZINC-OXIDE RAMAN-SCATTERING GROWTH DC PROPERTY IONS GA |
| 卷号 | 665 |
| DOI | 10.1016/j.tsf.2018.08.047 |
| 英文摘要 | Spatial distribution of highly energetic negative ions inherent in magnetron sputtering of oxides has long made low temperature deposition unsuitable for high quality films uniform over relatively large areas. Here we examine the distributions of structure as well as physical properties of magnetron sputtered Al-doped ZnO (AZO) films deposited at low temperatures (< 393 K) in which the bombardment from the negative oxygen ions was systematically studied by changing the discharge voltage (i.e., ion energy) and the substrate position (i.e., ion flux). The film structure was characterized by X-ray diffraction, Raman spectroscopy, and transmission electron microscopy; and the electrical and optical properties were obtained by a Hall system and Spectroscopic Ellipsometry. We found (i) that uniform yet high crystallite quality films can be obtained only when the energy of the negative ions was set below a threshold; (ii) that the ion flux exerted an ever-decreasing effect on modifying the film structure as the ion energy was reduced; and (iii) that a set of structural criteria, incorporating crystallite quality (orientations, size, lattice spacing) and point defects, were derived for low resistivity AZO films. The benefit of lowering the ion energy is then explained in terms of the favorable competition between radiation-induced defect generation and the subsequent dynamic annealing. These findings may pave a way for large-area coating of high quality AZO films at low temperatures. |
| 学科主题 | Materials Science ; Physics |
| ISSN号 | 0040-6090 |
| 源URL | [http://ir.nimte.ac.cn/handle/174433/23347]  |
| 专题 | 会议专题 会议专题_会议论文 |
| 推荐引用方式 GB/T 7714 | Meng, Fanping,Peng, Shou,Xu, Genbao,et al. Structure of uniform and high-quality Al-doped ZnO films by magnetron sputter deposition at low temperatures[C]. 见:. APR 23-27, 2018. |
入库方式： OAI收割
来源：宁波材料技术与工程研究所
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