Effects of film density on electrochromic tungsten oxide thin films deposited by reactive dc-pulsed magnetron sputtering
文献类型：会议论文
| 作者 | Sun, Xilian; Liu, Zhimin; Cao, Hongtao |
| 出版日期 | 2010 |
| 会议日期 | JUL 05-09, 2009 |
| 关键词 | WO3 FILMS DEVICES COATINGS WINDOWS |
| 卷号 | 504 |
| DOI | 10.1016/j.jallcom.2010.03.155 |
| 英文摘要 | The correlation between the electrochromic performance and the film density of the tungsten oxide thin films sputtered by reactive dc-pulsed magnetron sputtering with varying working pressure was investigated. It is found that the optical modulation and coloration efficiency of films are strongly affected by the amount of tungsten oxide present in the film. The coloration kinetic is also found to be sensitive to the film density, with the maximum value of 3.48 x 10(-10) cm(2)/s for the porous film deposited at higher pressure. X-ray diffraction and TEM showed that the films were amorphous. By using spectroscopic ellipsometer to anaylsis the surface roughness and refractive index of the sputtered films, we found that the film at higher working pressure was rough and lower density, which offered fast electrochromic response. (C) 2010 Elsevier B.V. All rights reserved. |
| 学科主题 | Chemistry ; Materials Science ; Metallurgy & Metallurgical Engineering |
| ISSN号 | 0925-8388 |
| 源URL | [http://ir.nimte.ac.cn/handle/174433/23690]  |
| 专题 | 会议专题 会议专题_会议论文 |
| 推荐引用方式 GB/T 7714 | Sun, Xilian,Liu, Zhimin,Cao, Hongtao. Effects of film density on electrochromic tungsten oxide thin films deposited by reactive dc-pulsed magnetron sputtering[C]. 见:. JUL 05-09, 2009. |
入库方式： OAI收割
来源：宁波材料技术与工程研究所
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