中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Mask-Guided Generation Method for Industrial Defect Images with Non-uniform Structures

文献类型:期刊论文

作者Wei, Jing2,3; Zhang, Zhengtao1,2,3; Shen, Fei1,2,3; Lv, Chengkan1,2,3
刊名MACHINES
出版日期2022-12-01
卷号10期号:12页码:17
关键词industrial manufacturing deep learning data augmentation defect generation defect detection
DOI10.3390/machines10121239
通讯作者Lv, Chengkan(chengkan.lv@ia.ac.cn)
英文摘要Defect generation is a crucial method for solving data problems in industrial defect detection. However, the current defect generation methods suffer from the problems of background information loss, insufficient consideration of complex defects, and lack of accurate annotations, which limits their application in defect segmentation tasks. To tackle these problems, we proposed a mask-guided background-preserving defect generation method, MDGAN (mask-guided defect generation adversarial networks). First, to preserve the normal background and provide accurate annotations for the generated defect samples, we proposed a background replacement module (BRM), to add real background information to the generator and guide the generator to only focus on the generation of defect content in specified regions. Second, to guarantee the quality of the generated complex texture defects, we proposed a double discrimination module (DDM), to assist the discriminator in measuring the realism of the input image and distinguishing whether or not the defects were distributed at specified locations. The experimental results on metal, fabric, and plastic products showed that MDGAN could generate diversified and high-quality defect samples, demonstrating an improvement in detection over the traditional augmented samples. In addition, MDGAN can transfer defects between datasets with similar defect contents, thus achieving zero-shot defect detection.
资助项目Youth Innovation Promotion Association, CAS ; [2020139]
WOS研究方向Engineering
语种英语
WOS记录号WOS:000900844200001
出版者MDPI
资助机构Youth Innovation Promotion Association, CAS
源URL[http://ir.ia.ac.cn/handle/173211/51314]  
专题精密感知与控制研究中心_精密感知与控制
通讯作者Lv, Chengkan
作者单位1.CASI Vis Technol Co Ltd, Luoyang 471000, Peoples R China
2.Univ Chinese Acad Sci, Sch Artificial Intelligence, Beijing 100049, Peoples R China
3.Chinese Acad Sci, Inst Automat, Beijing 100190, Peoples R China
推荐引用方式
GB/T 7714
Wei, Jing,Zhang, Zhengtao,Shen, Fei,et al. Mask-Guided Generation Method for Industrial Defect Images with Non-uniform Structures[J]. MACHINES,2022,10(12):17.
APA Wei, Jing,Zhang, Zhengtao,Shen, Fei,&Lv, Chengkan.(2022).Mask-Guided Generation Method for Industrial Defect Images with Non-uniform Structures.MACHINES,10(12),17.
MLA Wei, Jing,et al."Mask-Guided Generation Method for Industrial Defect Images with Non-uniform Structures".MACHINES 10.12(2022):17.

入库方式: OAI收割

来源:自动化研究所

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