Optically-controlled digital electrodeposition of thin-film metals for fabrication of nano-devices
文献类型:期刊论文
作者 | Liu N(刘娜); Wei FN(魏发南); Liu LQ(刘连庆)![]() ![]() ![]() ![]() |
刊名 | OPTICAL MATERIALS EXPRESS
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出版日期 | 2015 |
卷号 | 5期号:4页码:838-848 |
ISSN号 | 2159-3930 |
产权排序 | 1 |
通讯作者 | 刘娜 |
中文摘要 | Precise micro-scale patterning of metal thin-films with semiconductor materials is a critical step in the fabrication of any micro-devices. Conventional metal patterning methods such as photolithography, laser-induced direct printing techniques, and micro-contact printing methods all have different disadvantages such as high capital equipment cost and low throughput efficiency. In this article, an optically-controlled digital electrodeposition (ODE) method for direct patterning of metal thin-films on a semiconductor substrate has been demonstrated. This method allows for dynamic patterning of custom micro-scale silver structures with high conductivity of 2 x 10(7) S/m in large scale within 10 seconds and could reach a smallest line width of 2.7 mu m. The entire process is performed at room temperature and atmospheric pressure conditions, while requiring no photolithographic steps or metal nanoparticle inks. Utilizing this direct structural formation technique, a bottom-up protocol for rapidly assembling nanowire-based field-effect transistors has been demonstrated, which shows that this novel technique could potentially become an alternative, low-cost and flexible technology for fabricating integrated nano-devices. (C) 2015 Optical Society of America |
WOS标题词 | Science & Technology ; Technology ; Physical Sciences |
类目[WOS] | Materials Science, Multidisciplinary ; Optics |
研究领域[WOS] | Materials Science ; Optics |
关键词[WOS] | FEMTOSECOND LASER ; AG NANOPARTICLES ; DEPOSITION ; COPPER ; STEP |
收录类别 | SCI ; EI |
语种 | 英语 |
WOS记录号 | WOS:000352293100019 |
源URL | [http://ir.sia.ac.cn/handle/173321/16231] ![]() |
专题 | 沈阳自动化研究所_机器人学研究室 |
推荐引用方式 GB/T 7714 | Liu N,Wei FN,Liu LQ,et al. Optically-controlled digital electrodeposition of thin-film metals for fabrication of nano-devices[J]. OPTICAL MATERIALS EXPRESS,2015,5(4):838-848. |
APA | Liu N.,Wei FN.,Liu LQ.,Lai, Hok Sum Sam.,Yu HB.,...&Li WJ.(2015).Optically-controlled digital electrodeposition of thin-film metals for fabrication of nano-devices.OPTICAL MATERIALS EXPRESS,5(4),838-848. |
MLA | Liu N,et al."Optically-controlled digital electrodeposition of thin-film metals for fabrication of nano-devices".OPTICAL MATERIALS EXPRESS 5.4(2015):838-848. |
入库方式: OAI收割
来源:沈阳自动化研究所
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