机构

• 长春光学精密机械与物... [1]

采集方式

• OAI收割 [1]

内容类型

• 会议论文 [1]

发表日期

• 2007 [1]

学科主题

筛选

浏览/检索结果: 共1条，第1-1条 帮助 限定条件 发表日期：2007     条数/页： 5101520253035404550556065707580859095100 排序方式： 请选择提交时间升序提交时间降序题名升序题名降序作者升序作者降序发表日期升序发表日期降序 Automatic spin coater for concave spherical substrate (EI CONFERENCE) 会议论文  OAI收割 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies, AOMATT 2007: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, July 8, 2007 - July 12, 2007, Chengdu, China Fengchao L.; Jingsong G.; Xiaoguo F.; Jingli Z.; Zhijun X.; Jun H.; Fenglin X.; Huiqing W.; Xiaohan L. 收藏  |  浏览/下载：18/0  |  提交时间：2013/03/25 Coating photoresist film with uniform thickness on concave spherical substrate (CSS) is very important for microfabrication of concave spherical optical elements by lithography technique via a laser direct writer  for the uneven photoresist film will result in ununiformity of line width so as to influence the characters of optical elements. For improving the uniformity of photoresist film coating on CSS  an automatic spin coater was designed. The process and the mathematical model of spin coating for CSS were analyzed. Difficulties for realizing the spin coater consist of the control of multi-axis motion precisely and collaboratively  valves on/ff properly and real-timely. A flexible and well-behaved spinning motion system was achieved by tmeans of principal and subordinate CPUs control. The motion program for spin coating could be created and implemented automatically while the pressure and the valves were was watched and controlled in real time. Film coating and laser direct writing experiments on a CSS with aperture equals to 100 mm and radius equals to 370 mm were performed. Photoresist film with uniform thickness on CSS was obtained by selecting proper spin coating parameters such as rotational speed  acceleration and viscosity of the photoresist. After development  the section analysis by the atomic force microscope showed that photoresist film thickness was about 517 nm in the center and about 520 nm in the edge of substrate  the film thickness error was within 1%  and the line width was about 6.0 m with steep sides parallel each other. Experimental results indicate that uniform thickness of thin photoresist film has been coated on CSS by the spin coater  which contributes to quality improvement of laser direct writing lines on CSS.