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	Teaching machines to write like humans using L-attributed grammar 期刊论文 OAI收割 ENGINEERING APPLICATIONS OF ARTIFICIAL INTELLIGENCE, 2020, 卷号: 90, 页码: 10 作者: Shao, Yunxue; Liu, Cheng-Lin \| 收藏 \| 浏览/下载：32/0 \| 提交时间：2020/06/22 Automatic writing Handwritten character recognition L-attributed grammar Top-down derivation
	Automatic spin coater for concave spherical substrate (EI CONFERENCE) 会议论文 OAI收割 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies, AOMATT 2007: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, July 8, 2007 - July 12, 2007, Chengdu, China Fengchao L.; Jingsong G.; Xiaoguo F.; Jingli Z.; Zhijun X.; Jun H.; Fenglin X.; Huiqing W.; Xiaohan L. 收藏 \| 浏览/下载：22/0 \| 提交时间：2013/03/25 Coating photoresist film with uniform thickness on concave spherical substrate (CSS) is very important for microfabrication of concave spherical optical elements by lithography technique via a laser direct writer for the uneven photoresist film will result in ununiformity of line width so as to influence the characters of optical elements. For improving the uniformity of photoresist film coating on CSS an automatic spin coater was designed. The process and the mathematical model of spin coating for CSS were analyzed. Difficulties for realizing the spin coater consist of the control of multi-axis motion precisely and collaboratively valves on/ff properly and real-timely. A flexible and well-behaved spinning motion system was achieved by tmeans of principal and subordinate CPUs control. The motion program for spin coating could be created and implemented automatically while the pressure and the valves were was watched and controlled in real time. Film coating and laser direct writing experiments on a CSS with aperture equals to 100 mm and radius equals to 370 mm were performed. Photoresist film with uniform thickness on CSS was obtained by selecting proper spin coating parameters such as rotational speed acceleration and viscosity of the photoresist. After development the section analysis by the atomic force microscope showed that photoresist film thickness was about 517 nm in the center and about 520 nm in the edge of substrate the film thickness error was within 1% and the line width was about 6.0 m with steep sides parallel each other. Experimental results indicate that uniform thickness of thin photoresist film has been coated on CSS by the spin coater which contributes to quality improvement of laser direct writing lines on CSS.
	Key techniques of laser direct writing of fine lines on the spherical surface (EI CONFERENCE) 会议论文 OAI收割 ICO20: Optical Design and Fabrication, August 21, 2005 - August 26, 2005, Changchun, China Liang F.; Hu J. 收藏 \| 浏览/下载：19/0 \| 提交时间：2013/03/25 The main principles of laser direct writing (LDW) system for lines on the spherical surface (SS) are discussed. It is pointed out that line profile is determined by the exposure dose distribution which lies on the light intensity distribution of focus plane and the scanning speed. To improve the quality of line profile on the SS several key techniques as follows are introduced. Firstly the unique system configuration four axes mutually intersecting at the center of the SS is adopted which ensures the shape of the focus be maintained circular during the writing period. Secondly an automatic focus system (AFS) with the function of automatic focus in a certain range is introduced. Thirdly to guarantee the linear velocity to accord with the exposure character of the photoresist all the time an efficient arithmetic that controls motors run at appropriate angular velocity in different latitude is developed. Finally to achieve a stable and well-behaved system so as to compensate the velocity instability resulting from unavoidable errors of mechanical and electronics factor a powerful programmable multi-axis controller (PMAC) is utilized as the kernel element of the servocontrol system and the curves of step response and parabolic response achieved by feedforward and PID loop tuning indicate that the location precision and velocity stability have reached a high level. The experimental results of LDW of lines on the SS work piece with a diameter 30 mm and a radius equal to 100 mm are given. The section analysis of the lines on the photoresist by the atomic force microscope (AFM) after exposure and development is performed. The results show that line width is about 3.0 m and the steep sides of the lines are parallel to each other.