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	Consistent test for parametric models with right-censored data using projections 期刊论文 OAI收割 COMPUTATIONAL STATISTICS & DATA ANALYSIS, 2018, 卷号: 118, 页码: 112-125 作者: Sun, Zhihua; Ye, Xue; Sun, Liuquan \| 收藏 \| 浏览/下载：32/0 \| 提交时间：2018/07/30 Consistent test Curse-of-dimensionality-free Empirical process Projection Right-censored data
	Consistent test of error-in-variables partially linear model with auxiliary variables 期刊论文 OAI收割 JOURNAL OF MULTIVARIATE ANALYSIS, 2015, 卷号: 141, 页码: 118-131 作者: Sun, Zhihua; Ye, Xue; Sun, Liuquan \| 收藏 \| 浏览/下载：30/0 \| 提交时间：2018/07/30 Auxiliary variable Consistent test Measurement error Model check Partial linear model
	Test of an off-axis asphere by subaperture stitching interferometry (EI CONFERENCE) 会议论文 OAI收割 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, November 19, 2008 - November 21, 2008, Chengdu, China 作者: Zheng L.-G.; Zhang X.-J.; Zhang Z.-Y.; Zhang Z.-Y.; Deng W.-J. 收藏 \| 浏览/下载：58/0 \| 提交时间：2013/03/25 A new method combined subaperture stitching with interferometry(SSI) is introduced. It can test large and off-axis aspheric surfaces without the aid of other null optics. In this paper the basic principle and theory of the technique are analyzed. The synthetical optimization stitching model and effective stitching algorithm are established based on homogeneous coordinates transformation and simultaneous least-squares method. The software of SSI is devised and the prototype for testing of large aspheres by SSI is designed and developed. An off-axis asphere with the aperture of 376mm188mm is tested by this method. For comparison and validation and the difference of PV and RMS error between them is 0.047 e and 0.006 e the asphere is also tested by null compensation.The synthesized surface profile is consistent to that ofthe entire surface from null test respectively. So it provides another quantitative measurement for testing large aspheric surfaces and off-axis aspheres besides null-compensation. 2009 SPIE.
	Annular sub-aperture stitching interferometry for testing of large asphreical surfaces (EI CONFERENCE) 会议论文 OAI收割 International Symposium on Photoelectronic Detection and Imaging, ISPDI 2007: Optoelectronic System Design, Manufacturing, and Testings, September 9, 2007 - September 12, 2007, Beijing, China 作者: Zheng L.-G.; Zhang X.-J.; Deng W.-J.; Wang X.-K. 收藏 \| 浏览/下载：81/0 \| 提交时间：2013/03/25 Annular subaperture stitching interferometric technology can test large-aperture and the PV and RMS of residual error of the full aperture phase distribution is 0.027 and 0.0023 high numerical aperture aspheric surfaces with high resolution the relative error of PV and RMS is -0.53% and -0.31% respectively. The results conclude that this splicing model and algorithm are accurate and feasible. So it provides another quantitive measurement for test aspheric surfaces especially for large aperture aspheres besides null-compensation. low cost and high efficiency without auxiliary null optics. In this paper the basic principle and theory of the stitching method are introduced the reasonable mathematical model and effective splicing algorithm are established based on simultaneous least-squares method and Zernike polynomial fitting. The translation errors are eliminated from each subaperture through the synthetical optimization stitching mode it keeps the error from transmitting and accumulating. The numerical simulations have been carried on by this method. As results the surface map of the full aperture after stitching is consistent to the input surface map the difference of PV error and RMS error between them is -0.0074 and -0.00052 ( is 632.8nm) respectively
	Analysis of a precise instrument for measuring reference level involute (EI CONFERENCE) 会议论文 OAI收割 Third International Symposium on Precision Mechanical Measurements, August 2, 2006 - August 6, 2006, Xinjiang, China 作者: Zhang Y.; Wang X.; Wang X.; Wang X.; Wang L. 收藏 \| 浏览/下载：33/0 \| 提交时间：2013/03/25 Reference level involute is used for evaluating other involutes but it is very difficult to measure reference level involute exactly. Nowadays the available methods for measuring precise involute include single base disc mode electronic generation mode and CNC three-coordinate mode. But measurement accuracy of the modes above is not suitable for reference level involute. A precise instrument for measuring reference level involute double base discs instrument is introduced. It is consistent with generation principle of the involute entirely. Besides having the advantages of single basic disc instrument the instrument can remove Abbe error caused by the stylus and has no pressure deforming. The instrument's structure is described. The main sources of measurement errors are analyzed and methods for compensation are presented. Finally uncertainty of the instrument is given which meets reference level involute test specification.