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Structure, corrosion, and tribological properties of CrSiN coatings with various Si contents in 3.5% NaCl solution 期刊论文  OAI收割
SURFACE AND INTERFACE ANALYSIS, 2018, 卷号: 50, 期号: 4, 页码: 471-479
作者:  
Ye, Yuwei;  Wang, Haixin;  Wang, Yongxin
  |  收藏  |  浏览/下载:31/0  |  提交时间:2018/12/04
Three-dimensional simulation study of bias effect on single event effects of SiGe heterojunction bipolar transistor 期刊论文  OAI收割
ACTA PHYSICA SINICA, 2014, 卷号: 63, 期号: 24
作者:  
Zhang, JX (Zhang Jin-Xin);  He, CH (He Chao-Hui);  Guo, HX (Guo Hong-Xia);  Tang, D (Tang Du);  Xiong, C (Xiong Cen)
  |  收藏  |  浏览/下载:17/0  |  提交时间:2018/02/01
Analysis of impact of gyroscope synthetical error on an electric-optical stabilized control system (EI CONFERENCE) 会议论文  OAI收割
3rd International Conference on BioMedical Engineering and Informatics, BMEI 2010, October 16, 2010 - October 18, 2010, Yantai, China
作者:  
Zhang X.;  Zhang X.;  Zhang X.;  Jiang H.
收藏  |  浏览/下载:23/0  |  提交时间:2013/03/25
Assessment and inter-comparison of five high-resolution sea surface temperature products in the shelf and coastal seas around china 期刊论文  iSwitch采集
Continental shelf research, 2008, 卷号: 28, 期号: 10-11, 页码: 1286-1293
作者:  
Xie, Jiping;  Zhu, Jiang;  Li, Yan
收藏  |  浏览/下载:19/0  |  提交时间:2019/05/10
Characteristics of ZnMgO-based metal-semiconductor-metal photodetectors (EI CONFERENCE) 会议论文  OAI收割
International Symposium on Photoelectronic Detection and Imaging, ISPDI 2007: Photoelectronic Imaging and Detection, September 9, 2007 - September 12, 2007, Beijing, China
作者:  
Zhang J.;  Li B.;  Li B.;  Li B.;  Zhao Y.
收藏  |  浏览/下载:23/0  |  提交时间:2013/03/25
In recent years  ZnMgO semiconductor alloys  with a direct bandgap tunable between 3.37 eV and 7.8 eV  become one of the most suitable materials for the fabrication of ultraviolet detectors. In this paper  we have fabricated metal-semiconductor-metal photodetectors on 1-m thick Zn 0.8Mg0.2O films. The interdigital metal electrodes are 500 m long and 5 m wide with an interelectrode spacing 2 m  5 m and 10 m  respectively. Zn0.8Mg0.2O films were grown on quartz by ratio frequency magnetron sputtering at 500C. Dark current  spectral responsivity and pulse response were carried out for the devices with different finger pitches. All the photodetectors showed the peak responsivity at 330 nm and the ultraviolet-visible rejection ratio (R330 nm/R400 nm) is more than four orders of magnitude at 3 V bias. For the device with 2 m finger pitch  the detectivity was calculated as 4.21011 cm Hz 1/2/W at 330 nm. Furthermore  the transient response measurement for all devices revealed similar rise time of 10 ns. The 90%-10% fall times are 130 ns  170 ns and 230 ns for the devices with different finger pitches of 2 m  5 m and 10 m  respectively..  
The effect of N/Si ratio on the a-SiiH/SiNx interface of a-SirH/SiNx TFT (EI CONFERENCE) 会议论文  OAI收割
Asia Display 2007, AD'07, March 12, 2007 - March 16, 2007, Shanghai, China
Liu J. e.; Gao W.; Liao Y.; Jing H.; Fu G.
收藏  |  浏览/下载:24/0  |  提交时间:2013/03/25
The threshold voltage of a-Si: H/SiNx TFT will shift under long time gate bias stress  it is mostly leaded by charge trapping in gate insulator and defect creation in semiconductor. And it is hard to be applied in AMOLED for TFT because of its threshold voltage shift. In allusion to the phenomenon of charge trapping  a series of SiNx insulating films in different N/Si(0. 87 -1.68) ratio were deposited by PECVD in this paper  controlling different flow ratio of source gas SiH4 and NH3  and a great deal of tests (ellipsometer  infrared absorption (FTIR) and Electron Dispersion Spectrum (EDS) test ) were done on these samples. Based on these SiNx insulators  three different capacitance samples in MIS structure were done  degraded experiments and C-V tests on these samples were done. The C-V curve shift of capacitance which contained SiNx with slightly N-rich(N/Si is bigger slightly than 1. 33) was not evident before and after degradation  this result indicated that the defect density of this type SiN x was smaller  and could restrain charge chapping in the interface of a-Si:H/SiNx effectively. So that as gate insulator of TFT  SiN x with slightly N-rich could decrease the threshold voltage shift of TFT and enhance its stability effectively.