中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
机构
采集方式
内容类型
发表日期
学科主题
筛选

浏览/检索结果: 共4条,第1-4条 帮助

条数/页: 排序方式:
Displacement Analysis of Solar Magnetic Field Images in EUV Wavelengths of Space Solar Telescope 期刊论文  OAI收割
International Journal of Pattern Recognition and Artificial Intelligence, 2019, 卷号: 33, 期号: 3, 页码: 24
作者:  
Y.Liu;  K.F.Song;  X.D.Wang;  B.Chen;  J.L.Ma
  |  收藏  |  浏览/下载:41/0  |  提交时间:2020/08/24
Nanoscale patterns made by using a 13.5-nm Schwarzschild objective and a laser produced plasma source (EI CONFERENCE) 会议论文  OAI收割
Optical Micro- and Nanometrology IV, April 16, 2012 - April 18, 2012, Brussels, Belgium
作者:  
Wang X.;  Wang X.;  Wang X.;  Wang Z.;  Wang Z.
收藏  |  浏览/下载:37/0  |  提交时间:2013/03/25
Lithium fluoride (LiF) crystal is a very promising candidate as nanometer resolution EUV and soft X-ray detector. Compared with other EUV and soft X-ray detectors  charge coupled device and photographic films  LiF crystal has high resolution  large field of view and wide dynamic range. In this paper  using LiF crystal as EUV detector and a Schwarzschild objective (SO) working at 13.5nm as projection optics  mesh images with 4.2 m  1.2 m and 800 nm line width and pinhole patterns with 1.5m diameter are acquired in projection imaging mode and direct writing mode  respectively. Fluorescence intensity profiles of images show that the resolution of mesh image is 900 nm  and the one of pinhole image is 800 nm. In the experiments  a spherical condense mirror based on normal incidence type is used to eliminate the damage and contamination on the masks (mesh and pinhole) caused by the laser plasma  and the energy density is not decreased compared with that the masks are close to the plasma. The development of the SO  the alignment of the objective and the imaging experiments are also reported. 2012 Copyright Society of Photo-Optical Instrumentation Engineers (SPIE).  
Resolution performance of extreme ultraviolet telescope (EI CONFERENCE) 会议论文  OAI收割
4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, November 19, 2008 - November 21, 2008, Chengdu, China
作者:  
Yang L.;  Chen B.;  Chen B.;  Liang J.-Q.;  Ni Q.-L.
收藏  |  浏览/下载:30/0  |  提交时间:2013/03/25
Extreme Ultraviolet Telescope (EUT) will image solar corona in four EUV narrow bandpasses defined by multilayered coatings deposited on normal incidence optics. In order to make sure it will get sub-arcsecond angular resolution in the mission we have to test its resolution performance on ground. The EUT is aligned by Zygo interferometer first and a global wavefront error of 0.152 peak to valley is obtained ( = 632.8nm ). Because of the difficulty of angular resolution test for EUT at its operating wavelengths  we test its optical performance at visible and UV band. The method is to place the resolution test-target on the focal plane of collimator and illuminate the target by visible and UV light espectively  then the collimated light will go through EUT and image at focal plane on CCD. By analysis of the images obtained in experiments we conclude that the angular resolution of EUT is 1.22 at visible light ( = 570nm ) which is very close to diffraction limit (1.20) and according to these results we estimate that the operational wavelength resolution is better than 0.32  meets design requirements. While for UV light  the angular resolution is 1.53 that is different from diffraction limit (0.53)  the error comes mainly from large pixel of EUV camera. 2009 SPIE.  
Segmentation of loops from coronal EUV images 期刊论文  OAI收割
SOLAR PHYSICS, 2008, 卷号: 248, 期号: 2, 页码: 379-393
作者:  
Inhester, B.;  Feng, L.;  Wiegelmann, T.
收藏  |  浏览/下载:17/0  |  提交时间:2011/12/29