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	Solar EUV flux variation and flare brightenings 期刊论文 OAI收割 ADVANCES IN SPACE RESEARCH, 2012, 卷号: 50, 期号: 6, 页码: 683-689 作者: Bao, Xingming; Xie, Wenbin 收藏 \| 浏览/下载：22/0 \| 提交时间：2016/11/24 EUV brightenings EUV intensity Solar flares
	Nanoscale patterns made by using a 13.5-nm Schwarzschild objective and a laser produced plasma source (EI CONFERENCE) 会议论文 OAI收割 Optical Micro- and Nanometrology IV, April 16, 2012 - April 18, 2012, Brussels, Belgium 作者: Wang X.; Wang X.; Wang X.; Wang Z.; Wang Z. 收藏 \| 浏览/下载：37/0 \| 提交时间：2013/03/25 Lithium fluoride (LiF) crystal is a very promising candidate as nanometer resolution EUV and soft X-ray detector. Compared with other EUV and soft X-ray detectors charge coupled device and photographic films LiF crystal has high resolution large field of view and wide dynamic range. In this paper using LiF crystal as EUV detector and a Schwarzschild objective (SO) working at 13.5nm as projection optics mesh images with 4.2 m 1.2 m and 800 nm line width and pinhole patterns with 1.5m diameter are acquired in projection imaging mode and direct writing mode respectively. Fluorescence intensity profiles of images show that the resolution of mesh image is 900 nm and the one of pinhole image is 800 nm. In the experiments a spherical condense mirror based on normal incidence type is used to eliminate the damage and contamination on the masks (mesh and pinhole) caused by the laser plasma and the energy density is not decreased compared with that the masks are close to the plasma. The development of the SO the alignment of the objective and the imaging experiments are also reported. 2012 Copyright Society of Photo-Optical Instrumentation Engineers (SPIE).
	Fabrication of high-efficiency ultraviolet blazed gratings by use of direct Ar2-CHF3 ion-beam etching through a rectangular photoresist mask (EI CONFERENCE) 会议论文 OAI收割 International Symposium on Photoelectronic Detection and Imaging 2011: Sensor and Micromachined Optical Device Technologies, May 24, 2011 - May 26, 2011, Beijing, China Tan X. 收藏 \| 浏览/下载：25/0 \| 提交时间：2013/03/25 In ultraviolet spectroscopy groove irregularity and surface roughness of nanometer magnitude can cause a significant loss of diffraction efficiency. Therefore there is a constant need to improve the diffraction efficiency. A blazed grating can concentrate most of the light intensity into a desired diffraction order it is important to control the groove shape precisely so it is the optimum choice among gratings of different kinds of profile. As the operating wavelength of most UV spectral applications is less than 200 nm especially the blaze angle and the apical angle. We have presented a direct shaping method to fabricate EUV blazed gratings by using an ion-beam mixture of Ar+ and CHF2 +to etch K9 glass with a rectangular photoresist mask. With this method the required blaze angle is small we have succeeded in fabricating well-shaped UV blazed gratings with a 1200 line/mm groove density and 8.54 blaze angles and 1200 line/mm groove density and 11.68 blaze angles and the metrical efficiency is about 81% and 78%. The good performance of the gratings was verified by diffraction efficiency measurements. When one uses the etching model the conditions on the ion-beam grazing incident angle and the CHF3partial pressure should be noted. Besides since the etched groove shape depends on the aspect ratio of the photoresist mask ridge if we wish to fabricate larger gratings with this method we must improve the uniformity of the photoresist mask before ion-beam etching. 2011 Copyright Society of Photo-Optical Instrumentation Engineers (SPIE).