机构

• 合肥物质科学研究院 [3]
• 力学研究所 [1]
• 金属研究所 [1]
• 长春光学精密机械与物... [1]

采集方式

• OAI收割 [6]

内容类型

• 期刊论文 [5]
• 会议论文 [1]

发表日期

• 2020 [1]
• 2016 [2]
• 2008 [1]
• 2006 [2]

学科主题

筛选

浏览/检索结果: 共6条，第1-6条 帮助 条数/页： 5101520253035404550556065707580859095100 排序方式： 请选择题名升序题名降序提交时间升序提交时间降序作者升序作者降序发表日期升序发表日期降序 N-2/H(2)Non-thermal Transferred arc Plasma Nitriding Treatment of Stainless Steel at Atmospheric Pressure 期刊论文  OAI收割 PLASMA CHEMISTRY AND PLASMA PROCESSING, 2020 作者:  Guo, Q. J.;  Zhao, Y. J.;  Ni, G. H.;  Li, L.;  Lin, Q. F.   |  收藏  |  浏览/下载：40/0  |  提交时间：2020/10/23 Plasma nitriding  Non-thermal transferred arc  N-2  H(2)plasma  Atmospheric pressure   Distinguish the Role of DBD-Accompanying UV-Radiation in the Degradation of Bisphenol A 期刊论文  OAI收割 PLASMA CHEMISTRY AND PLASMA PROCESSING, 2016, 卷号: 36, 期号: 2, 页码: 585-598 作者:  Zhang, Hong;  Huang, Qing;  Li, Lamei;  Ke, Zhigang;  Wang, Qi   |  收藏  |  浏览/下载：31/0  |  提交时间：2017/10/30 Non-thermal Plasma  Dielectric Barrier Discharge (Dbd)  Ultraviolet (Uv) Radiation  Bisphenol a (Bpa)  Hydrogen Peroxide (H2o2)   Nanoscale zero-valent iron particles modified on reduced graphene oxides using a plasma technique for Cd(II) removal 期刊论文  OAI收割 JOURNAL OF THE TAIWAN INSTITUTE OF CHEMICAL ENGINEERS, 2016, 卷号: 59, 期号: 无, 页码: 389-394 作者:  Li, Jie;  Chen, Changlun;  Zhu, Kairuo;  Wang, Xiangke 收藏  |  浏览/下载：17/0  |  提交时间：2017/07/27 Nanoscale Zero-valent Iron  Graphene  H-2/ar Plasma  Cd(Ii)   Arc Root Motion In An Argon-Hydrogen Dc Plasma Torch 期刊论文  OAI收割 IEEE Transactions on Plasma Science, 2008, 页码: 1050-1051 作者:  Huang HJ(黄河激);  Pan WX(潘文霞);  Wu CK(吴承康) 收藏  |  浏览/下载：553/61  |  提交时间：2009/08/03 Arc Root Motion  Ar-H-2 Plasma  Dc Plasma  High Speed Video Camera  Plasma Stability  Fluctuations   Enhancing adhesion between diamond film and WC-Co substrate 期刊论文  OAI收割 ACTA METALLURGICA SINICA, 2006, 卷号: 42, 期号: 7, 页码: 763-769 作者:  Li Jianguo;  Hu Dongping;  Mei Jun;  Liu Shi;  Li Yiyi   |  收藏  |  浏览/下载：16/0  |  提交时间：2021/02/02 composite diamond film  WC-Co  adhesion  Murakami solution  H-2 plasma   Temperature-enhanced ultraviolet emission in ZnO thin film (EI CONFERENCE) 会议论文  OAI收割 Zhang Y. J.; Xu C. S.; Liu Y. C.; Liu Y. X.; Wang G. R.; Fan X. W. 收藏  |  浏览/下载：25/0  |  提交时间：2013/03/25 We have studied the structural and optical properties of ZnO thin films prepared by thermal oxidation of ZnS films deposited by plasma assisted electron-beam evaporation on Si(1 0 0) substrates. The transformation from zinc blende ZnS to hexagonal wurtzite ZnO is confirmed by Raman and X-ray diffraction (XRD) measurement. For the sample thermally oxidized at 600 C for 2 h  a novel UV emission peak Ix located at 3.22 eV (385 nm) has been observed. The temperature-dependent photoluminescence spectra show that the integrated intensity of Ix increases exponentially with increasing temperatures within the measuring temperature range  from 80 to 300 K  but the peak position remains nearly constant. We explain this behavior in terms of electron tunneling into the radiative recombination centers.