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长春光学精密机械与物... [3]
成都山地灾害与环境研... [1]
西双版纳热带植物园 [1]
昆明植物研究所 [1]
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水土保持研究所 [1]
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OAI收割 [9]
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期刊论文 [5]
会议论文 [4]
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A novel approach to obtain optimal exposure for 3D shape reconstruction of high dynamic range objects
期刊论文
OAI收割
Measurement Science and Technology, 2021, 卷号: 32, 期号: 9
作者:
Wu,Ke
;
Tan,Jie
;
Liu,Chengbao
  |  
收藏
  |  
浏览/下载:45/0
  |  
提交时间:2021/08/15
structured light
fringe projection
3D reconstruction
auto-exposure
High light exposure on seed coat increases lipid accumulation in seeds of castor bean (Ricinus communis L.), a nongreen oilseed crop
期刊论文
OAI收割
PHOTOSYNTHESIS RESEARCH, 2016, 卷号: 128, 期号: 2, 页码: 125-140
作者:
Zhang, Yang
;
Mulpuri, Sujatha
;
Liu, Aizhong
收藏
  |  
浏览/下载:42/0
  |  
提交时间:2016/08/22
Castor bean
Nongreen oilseed
Light exposure
Oil accumulation
Seed coat
High light exposure on seed coat increases lipid accumulation in seeds of castor bean (Ricinus communis L.), a nongreen oilseed crop
期刊论文
OAI收割
PHOTOSYNTHESIS RESEARCH, 2016, 卷号: 128, 期号: 2, 页码: 125-140
Zhang, Yang
;
Mulpuri, Sujatha
;
Liu, Aizhong
收藏
  |  
浏览/下载:28/0
  |  
提交时间:2016/07/06
Castor bean
Nongreen oilseed
Light exposure
Oil accumulation
Seed coat
Effect of different vegetation cover on the vertical distribution of soil organic and inorganic carbon in the Zhifanggou Watershed on the loess plateau
期刊论文
OAI收割
Catena, 2016, 卷号: 139, 期号: 0, 页码: 191-198
作者:
Baiqun Wang
;
Wei Zhao
  |  
收藏
  |  
浏览/下载:35/0
  |  
提交时间:2018/01/22
Soil Organic Carbon
Soil Inorganic Carbon
Vertical Distribution
Vegetation
Sun Light Exposure
Chinese Loess Platea
Environmental Factors that Affect Primary Plant Succession Trajectories on Lahars (Popocatépetl Volcano, Mexico)
期刊论文
OAI收割
Journal of Mountain Science, 2015, 卷号: 12, 期号: 5, 页码: 1254-1266
作者:
GARCÍA-ROMERO Arturo
;
ALANÍS-ANAYA Rocío Marisol
;
MUÑOZ-JIMÉNEZ Julio
收藏
  |  
浏览/下载:20/0
  |  
提交时间:2015/09/22
Ecosystem regeneration
Plant colonization
Primary succession
Temperate forest
Light exposure
Elevation
Soil
Slope aspect
Rapid Micro-Patterning of a Conductive PANI/MWNTs-Polymer Composite Using an Optically-induced Electrokinetics Chip
会议论文
OAI收割
IEEE Nanotechnology Materials and Devices Conference (IEEE NMDC), Honolulu, HI, OCT 16-19, 2012
作者:
Liu N(刘娜)
;
Liang WF(梁文峰)
;
Mai, John D.
;
Dong ZL(董再励)
;
Li WJ(李文荣)
收藏
  |  
浏览/下载:36/0
  |  
提交时间:2013/12/26
A flexible, dynamically programmable and low-cost method applicable to micro-patterning of a conductive polymer/carbon nanotube composite solution is significant due to the potential applications in many areas. This paper demonstrates a new micro-patterning method for fabricating electrodes from a conductive polyaniline (PANI)/MWNT composite using an optically-induced electrokinetics (OEK) chip. This method quickly patterns flexible polymeric electrodes with different geometries when a square waveform signal with amplitudes from 16-20 Volts and frequencies from 20-30 kHz are applied. The geometric dimensions of the electrodes can be varied dynamically by controlling the size and exposure time of the light pattern. The surface morphology of electrodes patterned by this method is scanned by an atomic force microscope (AFM) and a scanning electron microscope (SEM) which show that the electrodes are uniform and continuous. Furthermore, the geometric dimensions and resistances of the electrodes are measured and analyzed. Experimental results reveal that the relationship between the resistance and geometries of the electrodes obey Ohm's law and the resistivity of the electrodes is about 0.03 Omega.m.
Development and radiance calibration of three-waveband camera (EI CONFERENCE)
会议论文
OAI收割
International Symposium on Photonics and Optoelectronics, SOPO 2010, June 19, 2010 - June 21, 2010, Chengdu, China
作者:
Wang J.
;
Liu Y.
;
Liu Y.
;
Sun Q.
收藏
  |  
浏览/下载:29/0
  |  
提交时间:2013/03/25
An imaging system with three-waveband sharing one lens and an area CCD was developed. By rotating different filters into the beam path
the required waveband was selected. The optical system which can image in ultraviolet
visible and near infrared region was designed and the signal collecting system was integrated. The optical design and system integration have some advantages such as low cost
small size and light in weight. To obtain a high imaging quality
the radiation calibration is carried out in order to establish the relation between the average grey level of output image and the input radiance from the integrating sphere. According to the calibration data in experiments
the radiation dynamic range and the best working point of the system are determined. The experiment result shows that the dynamic range of the image system is maximal when the exposure time is 8ms in ultraviolet
0.5ms in visible and 0.125ms in near infrared region. 2010 IEEE.
Key techniques of laser direct writing of fine lines on the spherical surface (EI CONFERENCE)
会议论文
OAI收割
ICO20: Optical Design and Fabrication, August 21, 2005 - August 26, 2005, Changchun, China
Liang F.
;
Hu J.
收藏
  |  
浏览/下载:21/0
  |  
提交时间:2013/03/25
The main principles of laser direct writing (LDW) system for lines on the spherical surface (SS) are discussed. It is pointed out that line profile is determined by the exposure dose distribution
which lies on the light intensity distribution of focus plane and the scanning speed. To improve the quality of line profile on the SS
several key techniques as follows are introduced. Firstly
the unique system configuration
four axes mutually intersecting at the center of the SS
is adopted
which ensures the shape of the focus be maintained circular during the writing period. Secondly
an automatic focus system (AFS) with the function of automatic focus in a certain range is introduced. Thirdly
to guarantee the linear velocity to accord with the exposure character of the photoresist all the time
an efficient arithmetic that controls motors run at appropriate angular velocity in different latitude is developed. Finally
to achieve a stable and well-behaved system so as to compensate the velocity instability resulting from unavoidable errors of mechanical and electronics factor
a powerful programmable multi-axis controller (PMAC) is utilized as the kernel element of the servocontrol system
and the curves of step response and parabolic response achieved by feedforward and PID loop tuning indicate that the location precision and velocity stability have reached a high level. The experimental results of LDW of lines on the SS work piece with a diameter 30 mm and a radius equal to 100 mm are given. The section analysis of the lines on the photoresist by the atomic force microscope (AFM) after exposure and development is performed. The results show that line width is about 3.0 m
and the steep sides of the lines are parallel to each other.
The application of auto-controlled liquid crystal light valve arrays to photolithography shutter (EI CONFERENCE)
会议论文
OAI收割
ICO20: Optical Devices and Instruments, August 21, 2005 - August 26, 2005, Changchun, China
作者:
Chen Y.
收藏
  |  
浏览/下载:14/0
  |  
提交时间:2013/03/25
Photolithography shutter is usually used to control exposure in order to obtain patterns of code disc and metrology grating which are the core components of optical shaft encoder. But perforated film as photolithography shutter has many disadvantages such as taking too long time to perforate
easily making wrong code
lower reusable ratio. Mathematical models for resist property
luminous efficiency and exposure have been established by deducing their relations for avoiding the disadvantages
which provides the theory of using liquid crystal light valve (LCLV) replacing proforated film. Based on operating principles of LCLV and control theories of photolithography shutter
the principle diagram of control circuit of LCLV arrays has been designed according to theirs control principles. In the control system
LCLV arrays as photolithography shutter are realized by adopting DS75451 to drive them and using AT89C51 chip to control them. By photolithographic experiment
the patterns of code disc are good
the edges of lines are vertical
it indicates LCLV arrays as photolithography shutter may control exposure and light passing accords with the intending requires. It proves using LCLV arrays replacing perforated film as photolithography shutter is feasible completely.