中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
机构
采集方式
内容类型
发表日期
学科主题
筛选

浏览/检索结果: 共6条,第1-6条 帮助

条数/页: 排序方式:
Back support structure design of mirror of space remote sensor 期刊论文  OAI收割
Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering, 2019, 卷号: 48, 期号: 7
作者:  
K.Wang;  J.Dong;  P.Zhou;  X.Wang;  P.Jiang
  |  收藏  |  浏览/下载:37/0  |  提交时间:2020/08/24
Signal-to-noise ratio analysis of X-ray grating interferometry with the reverse projection extraction method 期刊论文  OAI收割
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 2014, 2014, 卷号: 196, 196, 期号: SI, 页码: 75-79, 75-79
作者:  
Wu, Z;  Wang, ZL;  Gao, K;  Wang, DJ;  Wang, SH
  |  收藏  |  浏览/下载:29/0  |  提交时间:2016/04/08
Precision analysis of simulation systems with hardware-in-loop caused by performance of three-Axis virtual flight motion simulator (EI CONFERENCE) 会议论文  OAI收割
2011 International Conference on Manufacturing Science and Technology, ICMST 2011, September 16, 2011 - September 18, 2011, Singapore, Singapore
Wang T.; Zhu M.-C.; Yin S.-L.; Jia H.-G.
收藏  |  浏览/下载:67/0  |  提交时间:2013/03/25
Simulation systems with hardware-in-loop are composed by three-Axis virtual flight motion simulator  simulation computer  load torque simulator  and visual simulation systems. Three-Axis Virtual Flight Motion Simulator are used to simulate the attitude of missile in simulation system with hardware-in-loop  so its performance influenced the result of simulation directly. This paper mainly analyzed the factors which influenced the performance of a three-Axis virtual flight motion simulator which we are used now in the lab  then analyzed the entire simulation system's error caused by these factors through numerical simulation method. By analysis we can see that bandwidth is the main factor influenced the precision of simulation systems with hardware-in-loop  mechanical device installation error and measurement error may also cause some errors of the systems at the same time.  
The system of 24-channel digital potentiometers based on single-chip microcomputer (EI CONFERENCE) 会议论文  OAI收割
2010 3rd International Conference on Advanced Computer Theory and Engineering, ICACTE 2010, August 20, 2010 - August 22, 2010, Chengdu, China
Song X.-R.; Liu Z.-G.; Wu Z.-Y.; Yu A.-F.
收藏  |  浏览/下载:44/0  |  提交时间:2013/03/25
This paper introduces that using digital potentiometers output 24-channel resistance to simulate the thermistors. Every channel has two digital potentiometers  one is low resolution and high value  the other is high resolution and low value. They are connected through Daisy-Chain and share chip-select. 24-channel digital potentiometers share the SPI's clock and SDI. Input the parameter in the computer and then send it to the single-chip microcomputer. The single-chip microcomputer receives the parameter and sends it to the digital potentiometers. After correcting the errors  the system meets the demands which are resistance range of 040K and maximum error of 15. The design can replace the traditional way in which the mechanical potentiometers are used to simulate the thermistors. 2010 IEEE.  
Orientation error analysis of alt-alt photoelectric telescope (EI CONFERENCE) 会议论文  OAI收割
4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, November 19, 2008 - November 21, 2008, Chengdu, China
作者:  
Wu X.-X.
收藏  |  浏览/下载:45/0  |  提交时间:2013/03/25
In order to ascertain the effects of main errors of alt-alt photoelectric telescope on measurement accuracy  orientation error is analyzed.For analyzing optical  mechanical and electrical errors from measured target to telescope picture  we construct 7 coordinates such as:the earth's core coordinate  alt-alt coordinate  etc.  carry through 21 times coordinate transformation  form measuring equation with 26 variables. and we utilize Monte Carlo method to calculate the orientation error  analyze the effects of errors upon pointing. The result indicates that the measuring error standard deviation of alt-alt telescope is minimum value about 10? at the zenith zone. and the deviation increases with the rotation angles of longitude and latitude axes. The model and the method not only can analyze and synthesize the main errors  but also provide a reference to the whole design. 2009 SPIE.  
Key techniques of laser direct writing of fine lines on the spherical surface (EI CONFERENCE) 会议论文  OAI收割
ICO20: Optical Design and Fabrication, August 21, 2005 - August 26, 2005, Changchun, China
Liang F.; Hu J.
收藏  |  浏览/下载:47/0  |  提交时间:2013/03/25
The main principles of laser direct writing (LDW) system for lines on the spherical surface (SS) are discussed. It is pointed out that line profile is determined by the exposure dose distribution  which lies on the light intensity distribution of focus plane and the scanning speed. To improve the quality of line profile on the SS  several key techniques as follows are introduced. Firstly  the unique system configuration  four axes mutually intersecting at the center of the SS  is adopted  which ensures the shape of the focus be maintained circular during the writing period. Secondly  an automatic focus system (AFS) with the function of automatic focus in a certain range is introduced. Thirdly  to guarantee the linear velocity to accord with the exposure character of the photoresist all the time  an efficient arithmetic that controls motors run at appropriate angular velocity in different latitude is developed. Finally  to achieve a stable and well-behaved system so as to compensate the velocity instability resulting from unavoidable errors of mechanical and electronics factor  a powerful programmable multi-axis controller (PMAC) is utilized as the kernel element of the servocontrol system  and the curves of step response and parabolic response achieved by feedforward and PID loop tuning indicate that the location precision and velocity stability have reached a high level. The experimental results of LDW of lines on the SS work piece with a diameter 30 mm and a radius equal to 100 mm are given. The section analysis of the lines on the photoresist by the atomic force microscope (AFM) after exposure and development is performed. The results show that line width is about 3.0 m  and the steep sides of the lines are parallel to each other.