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Chinese Academy of Sciences Institutional Repositories Grid
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CAS IR Grid
机构
半导体研究所 [2]
金属研究所 [1]
长春光学精密机械与物... [1]
寒区旱区环境与工程研... [1]
合肥物质科学研究院 [1]
近代物理研究所 [1]
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期刊论文 [6]
会议论文 [1]
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2024 [1]
2018 [1]
2016 [1]
2009 [2]
2005 [1]
1998 [1]
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学科主题
半导体物理 [1]
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First results of non-evaporable getter pump studies for the application in the EAST tokamak
期刊论文
OAI收割
VACUUM, 2024, 卷号: 226
作者:
Wang, Chao
;
Yu, Yaowei
;
Sun, Hao
;
Cao, Bin
;
Pan, Hao
  |  
收藏
  |  
浏览/下载:18/0
  |  
提交时间:2024/11/20
NEG
Particle exhaust
Pumping speed
EAST
Application of compact Non-Evaporable Getter and Sputter combination in UHV system of HIAF
期刊论文
OAI收割
VACUUM, 2018, 卷号: 157, 页码: 159-165
作者:
Luo, C.
;
Li, P.
;
Xie, W. J.
;
Wan, Y. P.
;
Chai, Z.
  |  
收藏
  |  
浏览/下载:38/0
  |  
提交时间:2019/03/27
Large pumping speed combination pump
NEG pumps
High Intensity Heavy-Ion Accelerator Facility
Booster ring
Dynamic flow method
Analysis of frost heave mechanisms in a high-speed railway embankment
期刊论文
iSwitch采集
CANADIAN GEOTECHNICAL JOURNAL, 2016, 卷号: 53, 期号: 3, 页码: 520-529
作者:
Zhang, Sheng
;
Sheng, Daichao
;
Zhao, Guotang
;
Niu, Fujun
;
He, Zuoyue
收藏
  |  
浏览/下载:44/0
  |  
提交时间:2019/10/09
frost heave
high-speed railway embankment
mud pumping
Ultrafast dynamics of four-state magnetization reversal in (ga,mn)as
期刊论文
iSwitch采集
Applied physics letters, 2009, 卷号: 95, 期号: 5, 页码: 3
作者:
Zhu, Yonggang
;
Zhang, Xinhui
;
Li, Tao
;
Huang, Xia
;
Han, Lifen
收藏
  |  
浏览/下载:41/0
  |  
提交时间:2019/05/12
Gallium arsenide
High-speed optical techniques
Iii-v semiconductors
Kerr magneto-optical effect
Magnetic domain walls
Magnetic switching
Magnetic thin films
Magnetisation reversal
Manganese compounds
Nucleation
Optical pumping
Semiconductor thin films
Semimagnetic semiconductors
Ultrafast dynamics of four-state magnetization reversal in (Ga,Mn)As
期刊论文
OAI收割
applied physics letters, 2009, 卷号: 95, 期号: 5, 页码: art. no. 052108
作者:
Zhang XH
收藏
  |  
浏览/下载:95/1
  |  
提交时间:2010/03/08
gallium arsenide
high-speed optical techniques
III-V semiconductors
Kerr magneto-optical effect
magnetic domain walls
magnetic switching
magnetic thin films
magnetisation reversal
manganese compounds
nucleation
optical pumping
semiconductor thin films
semimagnetic semiconductors
Study on LD-pumped Nd:YAG laser cutter (EI CONFERENCE)
会议论文
OAI收割
ICO20: Lasers and Laser Technologies, August 21, 2005 - August 26, 2005, Changchun, China
作者:
Zhang G.
;
Zhang G.
;
Zhang G.
;
Zhang J.
;
Zhang J.
收藏
  |  
浏览/下载:29/0
  |  
提交时间:2013/03/25
The theory of laser cutter and the technology neck is analyzed. We can conclude that it is almost impossible to deal with the waste thick silicon wafers which are yielded in producing silicon wafers by conventional eroding or diamond cutting
when the cutting velocity equals 100mm/min
while it is also unperfected with ecumenical laser cutter without good beam quality or precise laseroptics system. It is represented that high average power and high repetition rate laser with good beam quality and precise laseroptics system are pivotal to obtain excellent cutting effect such as thick groove depth
double-layer 0.75mm thick silicon wafer can be penetrated.. The cross section is fine and the groove is narrow
rapid cutting speed
the cutting quality meets the expecting demand.
fine kerf section without considering the effect of technique. Considering laser medium thermal lens effect and thermal focal length changing with pumping power
using plano-convex high reflectivity mirror as the back cavity mirror to compensate the heat lens influence
a /4 waveplate to compensate heat -induced birefraction
utilize the Nd:YAG self- aperture effect
more than 50 W average power 1.064 um IR output is obtained with beam quality factor (M2) equals 3.19. Through the LD-Pumped Nd:YAG laser cutter we developed with short focus length negative spherical aberration focusing lens
double axis linear step motor positioning system
suitable beam expander multiplying factor
appropriate diameter of exit beam aperture
proper repetition rate
when the cutting velocity equals 400mm/min
0.75mm thick silicon wafer can be penetrated
Simulations of reactive sputtering with constant voltage power supply
期刊论文
OAI收割
Journal of Applied Physics, 1998, 卷号: 84, 期号: 11, 页码: 6399-6408
S. L. Zhu
;
F. H. Wang
;
W. T. Wu
收藏
  |  
浏览/下载:31/0
  |  
提交时间:2012/04/14
soft-x-ray
high-rate deposition
emission-spectroscopy
titanium
nitride
thin-films
in-situ
chemical-analysis
partial-pressure
pumping speed
magnetron