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	Reducing edge error based on further analyzing the stability of edge TIF and correcting the post-edge algorithm in MRF process 期刊论文 OAI收割 OPTICAL REVIEW, 2019, 卷号: 27, 期号: 1, 页码: 14-22 作者: Zhong, Xianyun; Fan, Bin; Wu, Fan \| 收藏 \| 浏览/下载：16/0 \| 提交时间：2021/05/11 Magnetorheological Finishing Edge Effect Dwell Time Residual Errors
	Annular sub-aperture stitching interferometry for testing of large asphreical surfaces (EI CONFERENCE) 会议论文 OAI收割 International Symposium on Photoelectronic Detection and Imaging, ISPDI 2007: Optoelectronic System Design, Manufacturing, and Testings, September 9, 2007 - September 12, 2007, Beijing, China 作者: Zheng L.-G.; Zhang X.-J.; Deng W.-J.; Wang X.-K. 收藏 \| 浏览/下载：76/0 \| 提交时间：2013/03/25 Annular subaperture stitching interferometric technology can test large-aperture and the PV and RMS of residual error of the full aperture phase distribution is 0.027 and 0.0023 high numerical aperture aspheric surfaces with high resolution the relative error of PV and RMS is -0.53% and -0.31% respectively. The results conclude that this splicing model and algorithm are accurate and feasible. So it provides another quantitive measurement for test aspheric surfaces especially for large aperture aspheres besides null-compensation. low cost and high efficiency without auxiliary null optics. In this paper the basic principle and theory of the stitching method are introduced the reasonable mathematical model and effective splicing algorithm are established based on simultaneous least-squares method and Zernike polynomial fitting. The translation errors are eliminated from each subaperture through the synthetical optimization stitching mode it keeps the error from transmitting and accumulating. The numerical simulations have been carried on by this method. As results the surface map of the full aperture after stitching is consistent to the input surface map the difference of PV error and RMS error between them is -0.0074 and -0.00052 ( is 632.8nm) respectively
	The effect on tolerance distributing of an off-axis three mirror anastigmatic optical system with wavefront coding technology (EI CONFERENCE) 会议论文 OAI收割 Optical System Alignment and Tolerancing II, August 10, 2008 - August 11, 2008, San Diego, CA, United states 作者: Yan F.; Zhang X.-J.; Yan F. 收藏 \| 浏览/下载：35/0 \| 提交时间：2013/03/25 The wavefront coding technology is known as a system-level technology which can extend the depth of focus of optical system by innovative optical design and image restoration. This technology can control misfocus related aberrations including misfocus astigmatism and Petzval curvature temperature-related misfocus in digital imaging systems. It can also help optical system tolerate more residual error in optical manufacturing and alignment besides misfocus. The brief introduction of wavefront coding technology and the wavefront coded TMA system under research is presented respectively in part 1 and part 2. The "MTF similarity" is defined to describe the relationship among MTF at different position or different fields in the third part. It is also shown in this part that the MTF similarity of wavefront coded system is much higher than the normal system within a large range. In part 4 comparison between the origin system and the new system with wavefront coding technology is provided after multiple errors are introduced from which it can be observed that the system with wavefront coding technology can tolerate much bigger error than origin system. The error tolerance is re-distributed according to a new criterion based on MTF similarity. If the MTF similarity is less than a certain value it can be regarded that the system can tolerate the residual error. The new error tolerance is displayed and it is shown that the wavefront coding technology can also loosen the error distributing besides extended the depth of focus.